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A Novel Trench-Gated Power MOSFET With Reduced Gate Charge.

Authors :
Wang, Ying
Liu, Yan-Juan
Yu, Cheng-Hao
Cao, Fei
Source :
IEEE Electron Device Letters; Feb2015, Vol. 36 Issue 2, p165-167, 3p
Publication Year :
2015

Abstract

In this letter, we propose a novel trench power MOSFET structure with a p-n junction in trench to reduce the gate charge. We utilize the 2-D device simulator, ATLAS, to investigate the characteristics of the proposed structure and compare with the conventional structure. As a result, the proposed structure exhibits 49.5% enhancement in gate-charge Q\mathrm {\mathbf {g}} as compared with the conventional structure, without degrading the other electrical characteristics. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
07413106
Volume :
36
Issue :
2
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
100663263
Full Text :
https://doi.org/10.1109/LED.2014.2382112