Influence of silicon content on the microstructure, mechanical and tribological properties of magnetron sputtered Ti–Mo–Si–N films.

Ti–Mo–Si–N films with various Si content (0–17.2 at.%) were deposited by reactive magnetron sputtering and the effects of Si content on the microstructure, mechanical and tribological properties of Ti–Mo–Si–N films were investigated. The results showed that the face-centered cubic (fcc) interstitial solid solution of Ti–Mo–Si–N was formed by dissolution of Si into Ti–Mo–N lattice with the Si content in the range of 3.1–5.0 at.%. With a further increase in Si content, the films consisted of fcc-Ti-Mo-Si-N and amorphous Si 3 N 4 phases. The hardness and fracture toughness of Ti–Mo–Si–N films first increased and then decreased with the increase of Si content and the highest values were 34.5 GPa and 2.6 MP m 1/2 , respectively, at 5.0 at.% Si. The average friction coefficient and wear rate of Ti–Mo–Si–N films first decreased and then increased with the increase of Si content and the lowest values were 0.35 and 7.8 × 10 −8 mm 3 /Nmm, respectively, at 5.0 at.% Si. [ABSTRACT FROM AUTHOR]