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Atomic and molecular layer deposition for surface modification.
- Source :
-
Journal of Solid State Chemistry . Jun2014, Vol. 214, p7-11. 5p. - Publication Year :
- 2014
-
Abstract
- Abstract: Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas–solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin – even non-uniform – atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 00224596
- Volume :
- 214
- Database :
- Academic Search Index
- Journal :
- Journal of Solid State Chemistry
- Publication Type :
- Academic Journal
- Accession number :
- 95987497
- Full Text :
- https://doi.org/10.1016/j.jssc.2013.11.040