A novel fast capillary discharge system emitting intense EUV radiation: Possible source for EUV lithography

The performance of a novel and truly compact xenon-filled fast capillary discharge system has been studied by making spectroscopic and pinhole imaging measurements. A few kA current having a fast rise time was applied across the xenon-filled alumina capillary (0.8–1.2 mm diameter and 10–30 mm long) to produce radiation mostly in the EUV region (10–16 nm). The EUV radiation from the capillary was characterized by employing EUV spectrometers and a EUV pinhole camera. Time-integrated, as well as time-resolved, spectra furnished information about the radiation processes from the xenon plasma along with the wall of the capillary. A ‘super’ fast pinching effect is indicated from the pinhole images. The results obtained from the EUV spectroscopic and pinhole measurements are incorporated in this paper. This EUV source may be a strong contender for the basis of next generation lithography assembly. [Copyright &y& Elsevier]