A novel fast capillary discharge system emitting intense EUV radiation: Possible source for EUV lithography

MLA

Mohanty, S. R., et al. “A Novel Fast Capillary Discharge System Emitting Intense EUV Radiation: Possible Source for EUV Lithography.” Microelectronic Engineering, vol. 65, no. 1/2, Jan. 2003, p. 47. EBSCOhost, https://doi.org/10.1016/S0167-9317(02)00728-1.

APA

Mohanty, S. R., Robert, E., Dussart, R., Viladrosa, R., Pouvesle, J.-M., Fleurier, C., & Cachoncinlle, C. (2003). A novel fast capillary discharge system emitting intense EUV radiation: Possible source for EUV lithography. Microelectronic Engineering, 65(1/2), 47. https://doi.org/10.1016/S0167-9317(02)00728-1

Chicago

Mohanty, S.R., E. Robert, R. Dussart, R. Viladrosa, J.-M. Pouvesle, C. Fleurier, and C. Cachoncinlle. 2003. “A Novel Fast Capillary Discharge System Emitting Intense EUV Radiation: Possible Source for EUV Lithography.” Microelectronic Engineering 65 (1/2): 47. doi:10.1016/S0167-9317(02)00728-1.