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Relationship between the stress and bonding properties of amorphous SiNx:H films.
- Source :
-
Journal of Applied Physics . 12/15/1992, Vol. 72 Issue 12, p5676. 6p. 2 Charts, 7 Graphs. - Publication Year :
- 1992
-
Abstract
- Reports on the relationship between the stress and bonding properties of amorphous SiN[subx]:H films. Deposition of amorphous SiN[subx]:H films on single crystal silicon; Significance of amorphous SiN[subx]:H films deposited by plasma-enhanced chemical vapor deposition; Densities of the SiH and NH bonds.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 72
- Issue :
- 12
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7628283
- Full Text :
- https://doi.org/10.1063/1.351917