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Liquid junctions for characterization of electronic materials. III. Modulation spectroscopies of reactive ion etching of Si.
- Source :
-
Journal of Applied Physics . 8/15/1989, Vol. 66 Issue 4, p1765. 7p. - Publication Year :
- 1989
-
Abstract
- Investigates photoreflectance, electrolyte photoreflectance (PR) and electrolyte electroreflectance (EER) for various reactive ion etching treatments of n-silicon. Use of modulation spectroscopy; Dependence of the amplitude of the EER transition on the electrode potential for untreated silicon; Low-field limit of EER and PR.
- Subjects :
- *SILICON
*MODULATION spectroscopy
*ELECTROLYTES
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 66
- Issue :
- 4
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7626480
- Full Text :
- https://doi.org/10.1063/1.344367