Liquid junctions for characterization of electronic materials. III. Modulation spectroscopies of reactive ion etching of Si.

MLA

Shen, Wu-mian, et al. “Liquid Junctions for Characterization of Electronic Materials. III. Modulation Spectroscopies of Reactive Ion Etching of Si.” Journal of Applied Physics, vol. 66, no. 4, Aug. 1989, p. 1765. EBSCOhost, https://doi.org/10.1063/1.344367.

APA

Shen, W., Fantini, M. C. A., Pollak, F. H., Tomkiewicz, M., Leary, H. J., & Gambino, J. P. (1989). Liquid junctions for characterization of electronic materials. III. Modulation spectroscopies of reactive ion etching of Si. Journal of Applied Physics, 66(4), 1765. https://doi.org/10.1063/1.344367

Chicago

Shen, Wu-mian, M. C. A. Fantini, Fred H. Pollak, Micha Tomkiewicz, Herbert J. Leary, and J. P. Gambino. 1989. “Liquid Junctions for Characterization of Electronic Materials. III. Modulation Spectroscopies of Reactive Ion Etching of Si.” Journal of Applied Physics 66 (4): 1765. doi:10.1063/1.344367.