Back to Search
Start Over
Influence of rapid high-temperature anneals on the photoluminescence of erbium-doped GaN in the wavelength interval 1.0-1.6 μm.
- Source :
-
Semiconductors . Jan1999, Vol. 33 Issue 1, p1. 5p. - Publication Year :
- 1999
-
Abstract
- The influence of rapid-anneal conditions and subsequent coimplantation of oxygen ions on the photoluminescence of erbium ions implanted with an energy of 1 MeV and dose of 5 × 10[sup 14] cm[sup -2] in MOCVD-grown GaN films is investigated. The erbium photoluminescence intensity at a wavelength ∼1.54 µm increases as the fixed-time (15 s) anneal temperature is raised from 700 °C to 1300 °C. The erbium photoluminescence intensity can be increased by the coimplantation of oxygen ions at anneal temperatures in the indicated range below 900 °C. The transformation of the crystal structure of the samples as a result of erbium-ion implantation and subsequent anneals is investigated by Raman spectroscopy. [ABSTRACT FROM AUTHOR]
- Subjects :
- *ION implantation
*GALLIUM nitride
*THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 10637826
- Volume :
- 33
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- Semiconductors
- Publication Type :
- Academic Journal
- Accession number :
- 7318083
- Full Text :
- https://doi.org/10.1134/1.1187636