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Patterning large-area devices with a 5:1 reduction stepper
- Source :
-
Nuclear Instruments & Methods in Physics Research Section A . Dec2005, Vol. 555 Issue 1/2, p59-64. 6p. - Publication Year :
- 2005
-
Abstract
- Abstract: Contact or proximity aligners or 1:1 projection aligners are conventionally used for patterning large-area devices like silicon strip detectors for high-energy particle detection. Reduction steppers offer a far better pattern fidelity and an increased productivity but a very limited field size. This paper describes methods to overcome the field size limitations to pattern large-area position-sensitive particle detectors automatically and accurately with a 5:1 reduction stepper. [Copyright &y& Elsevier]
- Subjects :
- *ENGINEERING instruments
*PHYSICS instruments
*DETECTORS
*NONMETALS
Subjects
Details
- Language :
- English
- ISSN :
- 01689002
- Volume :
- 555
- Issue :
- 1/2
- Database :
- Academic Search Index
- Journal :
- Nuclear Instruments & Methods in Physics Research Section A
- Publication Type :
- Academic Journal
- Accession number :
- 19160639
- Full Text :
- https://doi.org/10.1016/j.nima.2005.09.004