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Dual-Step Selective Homoepitaxy of Ge with Low Defect Density and Modulated Strain Based on Optimized Ge/Si Virtual Substrate.

Authors :
Xu, Buqing
Du, Yong
Wang, Guilei
Xiong, Wenjuan
Kong, Zhenzhen
Zhao, Xuewei
Miao, Yuanhao
Wang, Yijie
Lin, Hongxiao
Su, Jiale
Li, Ben
Wu, Yuanyuan
Radamson, Henry H.
Source :
Materials (1996-1944). May2022, Vol. 15 Issue 10, p3594-3594. 13p.
Publication Year :
2022

Abstract

In this manuscript, a novel dual-step selective epitaxy growth (SEG) of Ge was proposed to significantly decrease the defect density and to create fully strained relaxed Ge on a Si substrate. With the single-step SEG of Ge, the threading defect density (TDD) was successfully decreased from 2.9 × 107 cm−2 in a globally grown Ge layer to 3.2 × 105 cm−2 for a single-step SEG and to 2.84 × 105 cm−2 for the dual-step SEG of the Ge layer. This means that by introducing a single SEG step, the defect density could be reduced by two orders of magnitude, but this reduction could be further decreased by only 11.3% by introducing the second SEG step. The final root mean square (RMS) of the surface roughness was 0.64 nm. The strain has also been modulated along the cross-section of the sample. Tensile strain appears in the first global Ge layer, compressive strain in the single-step Ge layer and fully strain relaxation in the dual-step Ge layer. The material characterization was locally performed at different points by high resolution transmission electron microscopy, while it was globally performed by high resolution X-ray diffraction and photoluminescence. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
19961944
Volume :
15
Issue :
10
Database :
Academic Search Index
Journal :
Materials (1996-1944)
Publication Type :
Academic Journal
Accession number :
157242032
Full Text :
https://doi.org/10.3390/ma15103594