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AlGaN/GaN Heterojunction Bipolar Transistor With Selective-Area Grown Emitter and Improved Base Contact.
- Source :
-
IEEE Transactions on Electron Devices . Mar2019, Vol. 66 Issue 3, p1197-1201. 5p. - Publication Year :
- 2019
-
Abstract
- We report AlGaN/GaN n-p-n heterojunction bipolar transistors (HBTs) on sapphire substrates with selective-area grown AlGaN emitters by metal–organic chemical vapor deposition. Metal–semiconductor contact on the external p-GaN base layer shows ohmic characteristics thanks to the dry-etching-free process of base–emitter junction. As a result, the maximum current gain $\beta $ is around 90 calculated from the Gummel plot of a ${20}\times {20}\,\,\mu \text{m}^{{2}}$ HBT device. Common-emitter ${I}$ – ${V}$ family curves exhibit offset voltage $({V} _{\text {offset}}) < 0.5$ V and knee voltage $({V} _{\text {knee}}) < 6.5$ V. A high current density $ {J}_{\text C}$ of 8 kA/cm2 and power density of 75 kW/cm2 were obtained. These values are the highest in the reported for GaN-based HBTs on sapphire substrates. The open-base breakdown voltage (${BV}_{\text {CEO}}$) exceeds 98 V comparable with direct-growth GaN-based HBTs. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 66
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 136509723
- Full Text :
- https://doi.org/10.1109/TED.2018.2890207