Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure.

<bold>Objective: </bold>To study if hysteroscopy and short-term copper intrauterine device placement (Cu-IUD) improves the pregnancy rates of women with repeated implantation failure (RIF) undergoing frozen-thawed embryo transfer (FET).<bold>Design: </bold>Retrospective study.<bold>Setting: </bold>Medical university hospital.<bold>Patient(s): </bold>Infertile women with at least two implantation failures with the use of at least one good-quality embryo.<bold>Intervention(s): </bold>All patients received operative hysteroscopy in the follicular cycle, and if endometrial polyps, polypoid endometrium, or intrauterine adhesions were found they were removed. In some patients, a Cu-IUD was inserted immediately after hysteroscopy and removed after two menstrual periods before embryo implantation. All patients underwent in vitro fertilization or intracytoplasmic sperm injection and FET.<bold>Main Outcome Measure(s): </bold>Clinical pregnancy and implantation rates.<bold>Result(s): </bold>A total of 440 women with a mean age of 33.42 ± 4.45 years (range 23-47 y) were included. There were 382 patients (554 cycles) in the IUD group and 58 patients (87 cycles) in the non-IUD group. The two groups were similar regarding age, body mass index, and infertility factors. The IUD group had a significantly higher implantation rate (29.29% vs. 16.56%), chemical pregnancy rate (53.25 vs. 41.38%), and clinical pregnancy rate (45.13% vs. 26.44%) than the non-IUD group. Multivariable regression analysis indicated that the odds of a chemical pregnancy was significantly increased with IUD usage.<bold>Conclusion(s): </bold>Cu-IUD placement for two menstrual cycles at the time of hysteroscopy can improve the implantation and pregnancy rates in women with RIF. [ABSTRACT FROM AUTHOR]