1. Heteroepitaxially grown homojunction gallium oxide PN diodes using ion implantation technologies
- Author
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Chih-Yang Huang, Xin-Ying Tsai, Fu-Gow Tarntair, Catherine Langpoklakpam, Thien Sao Ngo, Pei-Jung Wang, Yu-Cheng Kao, Yi-Kai Hsiao, Niall Tumilty, Hao-Chung Kuo, Tian-Li Wu, Ching-Lien Hsiao, and Ray-Hua Horng
- Subjects
Materials of engineering and construction. Mechanics of materials ,TA401-492 - Abstract
Although advancements in n- and p-doping of gallium oxide (Ga2O3) are underway, the realization of functional pn diodes remains elusive. Here, we present the successful fabrication of a Ga2O3 pn diode utilizing ion implantation technology. The Ga2O3 epilayers were grown on c-plane sapphire substrates by metalorganic chemical vapor deposition (MOCVD). P-type conductivity Ga2O3 epilayer, confirmed by Hall effect analysis, was achieved by phosphorus (P) ion implantation followed with a rapid thermal annealing (RTA) process. This p-Ga2O3 epilayer reveals a significant reduction in resistivity ( 3kT/q) and remained very low at 2✕10−8 A, as the diode operated at 150oC. The behavior could be due to Ga2O3 being a wide bandgap material.
- Published
- 2024
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