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3. Multigate MOSFET Technology.

Author

Colinge, Jean-Pierre and Xiong, Weize (Wade)

Abstract

Outlines the issues associated with multigate FET manufacturing. This chapter describes thin-fin formation techniques, advanced gate stack deposition and source/drain resistance reduction techniques. Issues related to fin crystal orientation and mobility enhancement via strain engineering are tackled as well. [ABSTRACT FROM AUTHOR]

Published
2008
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