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Multigate MOSFET Technology.
- Source :
- FinFETs & Other Multi-Gate Transistors; 2008, p49-111, 63p
- Publication Year :
- 2008
-
Abstract
- Outlines the issues associated with multigate FET manufacturing. This chapter describes thin-fin formation techniques, advanced gate stack deposition and source/drain resistance reduction techniques. Issues related to fin crystal orientation and mobility enhancement via strain engineering are tackled as well. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISBNs :
- 9780387717517
- Database :
- Supplemental Index
- Journal :
- FinFETs & Other Multi-Gate Transistors
- Publication Type :
- Book
- Accession number :
- 33080894
- Full Text :
- https://doi.org/10.1007/978-0-387-71752-4_2