Back to Search Start Over

Multigate MOSFET Technology.

Authors :
Colinge, Jean-Pierre
Xiong, Weize (Wade)
Source :
FinFETs & Other Multi-Gate Transistors; 2008, p49-111, 63p
Publication Year :
2008

Abstract

Outlines the issues associated with multigate FET manufacturing. This chapter describes thin-fin formation techniques, advanced gate stack deposition and source/drain resistance reduction techniques. Issues related to fin crystal orientation and mobility enhancement via strain engineering are tackled as well. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISBNs :
9780387717517
Database :
Supplemental Index
Journal :
FinFETs & Other Multi-Gate Transistors
Publication Type :
Book
Accession number :
33080894
Full Text :
https://doi.org/10.1007/978-0-387-71752-4_2