1. Efficient Bayesian inversion for shape reconstruction of lithography masks
- Author
-
Farchmin, Nando, Hammerschmidt, Martin, Schneider, Philipp-Immanuel, Wurm, Matthias, Bodermann, Bernd, Bär, Markus, and Heidenreich, Sebastian
- Subjects
Physics - Data Analysis, Statistics and Probability ,Physics - Accelerator Physics - Abstract
Background: Scatterometry is a fast, indirect and non-destructive optical method for quality control in the production of lithography masks. To solve the inverse problem in compliance with the upcoming need for improved accuracy, a computationally expensive forward model has to be defined which maps geometry parameters to diffracted light intensities. Aim: To quantify the uncertainties in the reconstruction of the geometry parameters, a fast to evaluate surrogate for the forward model has to be introduced. Approach: We use a non-intrusive polynomial chaos based approximation of the forward model which increases speed and thus enables the exploration of the posterior through direct Bayesian inference. Additionally, this surrogate allows for a global sensitivity analysis at no additional computational overhead. Results: This approach yields information about the complete distribution of the geometry parameters of a silicon line grating, which in return allows to quantify the reconstruction uncertainties in the form of means, variances and higher order moments of the parameters. Conclusion: The use of a polynomial chaos surrogate allows to quantify both parameter influences and reconstruction uncertainties. This approach is easy to use since no adaptation of the expensive forward model is required., Comment: arXiv admin note: substantial text overlap with arXiv:1910.14435
- Published
- 2020
- Full Text
- View/download PDF