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Additional file 3: Figure S1. Examples of sleep encephalogram for VS patients with or without sleep cycles. A) Example of sleep encephalogram for VS patients with sleep cycles. B) Example of sleep encephalogram for VS patients without sleep cycles. VS: vegetative state. Figure S2. Changes in EEG power of VS patients without sleep cycles before and after tDCS. A) Topographical distribution of alpha, beta and gamma power on the scalp in the sham group. Red and blue indicate maximum and minimum EEG power (10*log10(μv2/Hz)), respectively. B) Topographical distribution of alpha, beta and gamma power on the scalp in the tDCS group. Red and blue indicate maximum and minimum EEG power (10*log10(μv2/Hz)) at each time point, respectively. C-E) Comparison of EEG power in the parietooccipital region before and after treatment both in the sham group and the tDCS group (Electrode number: 5,6,7,8,18,19,,20,21,22,23,24,25,26,27, 30,31,32,33,36,37,38,39,44,45,46,47,57), including alpha power (C), beta power (D) and gamma power (E). n.s: no significant difference; P values were determined using analysis of covariance (ANCOVA) and age was included as a covariate; tDCS: transcranial direct current stimulation; VS: vegetative state.

Ni-based magnetic catalysts exhibited moderate activity, low cost, and magnetic reusability for hydrogenation reactions. However, Ni nanoparticles anchored on magnetic supports suffer commonly from undesirable agglomeration during catalytic reactions due to the relatively weak affinity of magnetic support to Ni nanoparticles. A hierarchically yolk-shell Fe@SiO2/Ni catalyst with an inner movable Fe core and an ultrathin SiO2/Ni nanosheets-assembled shell was synthesized via a self-templating reduction strategy with the hierarchically yolk-shell Fe3O4@nickel silicate nanocomposite as the precursor. Spatial confinement of highly dispersed Ni nanoparticles of the mean size of 4 nm into ultrathin SiO2 nanosheets of the 2.6-nm thickness could not only prevent their agglomeration during catalytic transformations but also expose abundant active Ni sites accessible to the reactants. Moreover, the large inner cavities and interlayer space among the assembled ultrathin SiO2/Ni nanosheets provide suitable mesoporous channels for the diffusion of the reactants toward active sites. As expected, the Fe@SiO2/Ni catalyst displays high activity, high stability and magnetic recoverability for the reduction of nitroaromatic compounds. In particular, the Ni-based catalyst maintained the conversion of 4-Nitroamine of over 98% and preserved the initial yolk-shell structure without any obvious aggregation of Ni nanoparticles after over ten catalytic cycles, confirming the high structural stability of the Ni-based catalyst.

SiO2-based microcapsules containing hydrophobic molecules exhibited potential applications such as extrinsic self-healing, drug delivery, due to outstanding thermal and chemical stability of SiO2. However, to construct SiO2-based microcapsules with both high encapsulation loading and long-term structural stability is still a troublesome issue, limiting their further utilization. We herein design a single-batch route, a combined interfacial and in-situ polymerization strategy, to fabricate epoxy-containing SiO2-based microcapsules with both high encapsulation loading and long-term structural stability. The final SiO2-based microcapsules preserve high encapsulation loading of 85.7 wt% by controlling exclusively hydrolysis and condensed polymerization at oil/water interface in the initial interfacial polymerization step. In the subsequent in-situ polymerization step, the initial SiO2-based microcapsules as seeds could efficiently harvest SiO2 precursors and primary SiO2 particles to finely tune the SiO2 wall thickness, thereby enhancing long-term structural stability of the final SiO2-based microcapsules including high thermal stability with almost no any weight loss until 250°C, and strong tolerance against nonpolar solvents such as CCl4 with almost unchanged core-shell structure and unchanged core weight after immersing into strong solvents for up to 5 days. These SiO2-based microcapsules are extremely suited for processing them into anticorrosive coating in the presence of nonpolar solvents for self-healing application.

In this work, we report a two-step thermal pressing method of fabricating microdisk lasers that are suitable for processing thermally stable glass materials, and we utilize a tellurite glass (TeO2-ZnO-Na2O) to demonstrate the feasibility of this method. Compared with the conventional microdisk fabricating methods that rely on a series of complicated procedures, such as lithography, etching, thermal reflow, and ion implantation, this thermal pressing method involves only two heating procedures and can be accomplished with simple laboratory resistive heating furnaces. In the first heating procedure, we crush bulk tellurite glass into powders and drop those powders through a vertical heating furnace. Glass powders are transformed into microspheres by surface tension in the furnace. In the second heating procedure, microspheres are placed between two flat/smooth surfaces and are thermally treated when being pressed with suitable weights. With this procedure, the “flattened” microspheres turn into the microdisks. In this work, we demonstrate that our fabricated tellurite glass microdisks possess diameters of 100－400 μm, thinnest thickness of ～ 8 μm, and typical quality-factor (Q-factor) of ～ 105. We also dope tellurite glass with active dopants such as Nd3+ and Tm3+ to fabricate the active microdisk resonators. We couple those active microdisk resonators with fiber tapers and demonstrate that with appropriate pump power, apparent fluorescence whispering gallery mode and laser mode can be obtained. Taking a 105.74-μm-diameter, 10.4-μm-thickness, and Nd3+-doped tellurite glass microdisk for example, we show that as the pump power increases above a threshold of 1.364 mW, a lasing peak near 1.06 μm can be obtained. We also show that lasing peaks near 1.9 μm can be obtained by coupling/pumping Tm3+ doped microdisks.

UV-triggered self-healing of single microcapsules has been a good candidate to enhance the life of polymer-based aerospace coatings because of its rapid healing process and healing chemistry based on an accurate stoichiometric ratio. However, free radical photoinitiators used in single microcapsules commonly suffer from possible deactivation due to the presence of oxygen in the space environment. Moreover, entrapment of polymeric microcapsules into coatings often involves elevated temperature or a strong solvent, probably leading to swelling or degradation of polymer shell, and ultimately the loss of active healing species into the host matrix. We herein describe the first single robust SiO2 microcapsule self-healing system based on UV-triggered cationic polymerization for potential application in aerospace coatings. On the basis of the similarity of solubility parameters of the active healing species and the SiO2 precursor, the epoxy resin and cationic photoinitiator are successfully encapsulated into a single SiO2 microcapsule via a combined interfacial/in situ polymerization. The single SiO2 microcapsule shows solvent resistance and thermal stability, especially a strong resistance for thermal cycling in a simulated space environment. In addition, the up to 89% curing efficiency of the epoxy resin in 30 min, and the obvious filling of scratches in the epoxy matrix demonstrate the excellent UV-induced healing performance of SiO2 microcapsules, attributed to a high load of healing species within the capsule (up to 87 wt %) and healing chemistry based on an accurate stoichiometric ratio of the photoinitiator and epoxy resin at 9/100. More importantly, healing chemistry based on a UV-triggered cationic polymerization mechanism is not sensitive to oxygen, extremely facilitating future embedment of this single SiO2 microcapsule in spacecraft coatings to achieve self-healing in a space environment with abundant UV radiation and oxygen.