6 results on '"Weemers, K."'
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2. Low energy boron implantation in silicon and room temperature diffusion
3. Characterization of low-energy (100 eV-10 keV) boron ion implantation.
4. Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants: Problems and solutions.
5. Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry
6. Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry.
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