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Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry.
- Source :
- 1998 International Conference on Ion Implantation Technology Proceedings (Cat No98EX144); 1999, Issue 2, p712-712, 1p
- Publication Year :
- 1999
Details
- Language :
- English
- ISBNs :
- 9780780345386
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- 1998 International Conference on Ion Implantation Technology Proceedings (Cat No98EX144)
- Publication Type :
- Conference
- Accession number :
- 92129046
- Full Text :
- https://doi.org/10.1109/IIT.1998.813766