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Y2O3 was in situ deposited on a freshly grown molecular beam epitaxy GaAs(001)-4 × 6 surface by atomic layer deposition (ALD). In situ synchrotron radiation photoemission was used to study the mechanism of the tris(ethylcyclopentadienyl)yttrium [Y(CpEt)3] and H2O process. The exponential attenuation of Ga 3d photoelectrons confirmed the laminar growth of ALD-Y2O3. In the embryo stage of the first ALD half-cycle with only Y(CpEt)3, the precursors reside on the faulted As atoms and undergo a charge transfer to the bonded As atoms. The subsequent ALD half-cycle of H2O molecules removes the bonded As atoms, and the oxygen atoms bond with the underneath Ga atoms. The product of a line of Ga–O–Y bonds stabilizes the Y2O3 films on the GaAs substrate. The resulting coordinatively unsaturated Y–O pairs of Y2O3 open the next ALD series. The absence of Ga2O3, As2O3, and As2O5 states may play an important role in the attainment of low interfacial trap densities (Dit) of

The Interface of Ag with p -type α2 GaAs(001)-2 × 4 has been studied to further understand the formation mechanism of the Schottky barrier height (SBH). In the initial phase of Ag deposition, high-resolution core-level data show that Ag adatoms effectively passivate the surface As-As dimers without breaking them apart. The Ag(+)-As(−) dipoles are thus generated with a maximal potential energy of 0.26 eV; a SBH of 0.38 eV was measured. Greater Ag coverage causes elemental segregation of As/Ga atoms, reversing the direction of the net dipole. The band bending effect near the interface shows a downward shift of 0.08 eV, and the final SBH is similar to the value as measured at the initial Ag deposition. Both parameters are secured at 0.25 A of Ag thickness prior to the observation of metallic behavior of Ag. Inadequacy of the metal-induced gap-state model for explaining SBH is evident.

Y2O3 was in situ deposited on a freshly grown molecular beam epitaxy GaAs(001)-4 × 6 surface by atomic layer deposition (ALD). In situ synchrotron radiation photoemission was used to study the mechanism of the tris(ethylcyclopentadienyl)yttrium [Y(CpEt)3] and H2O process. The exponential attenuation of Ga 3d photoelectrons confirmed the laminar growth of ALD-Y2O3. In the embryo stage of the first ALD half-cycle with only Y(CpEt)3, the precursors reside on the faulted As atoms and undergo a charge transfer to the bonded As atoms. The subsequent ALD half-cycle of H2O molecules removes the bonded As atoms, and the oxygen atoms bond with the underneath Ga atoms. The product of a line of Ga–O–Y bonds stabilizes the Y2O3 films on the GaAs substrate. The resulting coordinatively unsaturated Y–O pairs of Y2O3 open the next ALD series. The absence of Ga2O3, As2O3, and As2O5 states may play an important role in the attainment of low interfacial trap densities (Dit) of

Using in situ synchrotron-radiation photoelectron spectroscopy, the band offsets and the surface dipole potential energy for cycle-by-cycle atomic layer deposited (ALD) Y2O3 on p-type GaAs(0 0 1)-4 × 6 were studied. We have characterized the electronic property for laminar films. The valence- and conduction-band offsets and interfacial dipole potential energy are approximately 1.75, 2.4, and 0.46 eV, respectively. The dipole direction points outward, showing that Y(+) is located at the topmost layer and the O(−) ions participate in the bonding with the GaAs surface atoms.

Photoemission from an epi Ge(001)-2 × 1 surface is presented using synchrotron radiation as a probe. The topmost surface atoms are buckled with the up-dimer and down-dimer atoms exhibiting surface core-level shifts (SCLSs) of −0.492 and −0.178 eV, respectively. The subsurface layer shows a +0.083 eV SCLS. The final-state effect suffices to explain the sign of the shift. The electron affinity and ionization potential for the epi Ge surface are 4.36 and 5.09 eV, respectively. An argument contrasting the current results with those of existing reports with non-epi surfaces is also given. Non-epi surfaces possess Ge surfaces with isolated single atoms or small droplets that affect Ge's contact with dielectric layers and the electric performances of the Ge metal–oxide–semiconductor structure.