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type:Journal Article, The valence-band spectrum of an amorphous OsO2 film deposited by glow discharge of OsO4 vapor can bepredicted well with calculated electronic band structure of crystalline OsO2 from first principles using theliner-muffin-tin-orbital method with the local-density approximation. Resistivity of the amorphous OsO2 wasless than 631023 V cm at 80 K, and it was almost temperature independent, but the temperature coefficient ofresistivity was negative. The Hall coefficient of the amorphous OsO2 increased with temperature, and wassaturated at around 220 K. Temperature dependence of the Hall mobility was proportional to T3/2, and itimplies that the scattering of charged carriers by ionized atoms is dominant below 220 K., source:https://doi.org/10.1103/PhysRevB.59.11125, source:http://www.aps.org

type:Journal Article, Indium tin oxide (ITO) thin films were sputter deposited by using working gas containing hydrogen on glass substrate without any heat treatments. The films demonstrated X-ray diffraction due to polycrystalline ITO, blue-green photoluminescence (PL) due to oxygen defects in nano-structured ITO crystals, and paramagnetic behaviour in temperature dependence of magnetization overlapped with diamagnetic signal from the substrate. The carrier density n of the films was of the order of 1020 cm−3, and varied as an inverse of V-character with the hydrogen concentration [H] in the gas. The n value peaked at [H] = 1%. Spectral features at ≈430 and ≈470 nm of the PL emission were invariant with [H]. The order of the density of electrons N with spins obeying the Curie law was 1023 cm−3, and the variation in N with [H] was almost parallel to that in n with [H].

type:Journal Article, X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectroscopy-elastic recoil detection analysis (RBS-ERDA) revealed that hydrogen in working gas for dc-plasma sputter deposition resided in indium tin oxide (ITO) films and generated the O(-) state seen as the suboxide-like O 1s peak in XPS. Growth of the suboxide-like O 1s peak was parallel with an increase of the resided hydrogen quantified by RBS-ERDA. The first-principles band structure calculation revealed that the electronic structure of In(2)O(3) crystal was realized typically for the most conductive as-deposited film grown in the gas containing hydrogen of 1%. The as-deposited film grown in the gas containing hydrogen of more than 1% exhibited rather high density but low mobility of carriers and showed the electronic structure above 4 eV originated from the O(-) state due to the resided hydrogen in addition to that of the most conducting one. Both well preserved In(2)O(3) band structure and proper concentration of the O(2-) vacancy are indispensable for achieving the highest conductivity; however, the O(-) state lowers efficiency of the carrier doping using the O(2-) vacancy in the lattice and increases density of the ionized scattering center for the carriers., source:https://doi.org/10.1021/am9006676

type:Journal Article, Surface morphology and microstructure of indium tin oxide (ITO) thin films sputter deposited without heat treatment were obviously different from each other depending on the hydrogen concentration [H] in the working gas. The film surface became smoother with increasing [H] to 1%, but nucleation and growth of grains were apparent above [H] = 1.5%. The width of columnar grains in the ≤200 nm-thick films narrowed from ≈100 nm to ≈50 nm with increasing [H] from 0% to 1.5%. Randomly oriented and agglomerated grains were observed for the film deposited with [H] = 3.6%. Hydrogen added to the working gas induced reduction of the grain size, and then resulted in lowering of the carrier mobility., source:https://doi.org/10.1016/j.matlet.2009.08.010

type:Journal Article, Thin films of indium tin oxide (ITO) sputter-deposited by dc-plasma containing deuterium on glass substrate without any heat treatments exhibited gradual lowering in electrical resistivity with increasing the deuterium content [D2] in plasma gas by 1% and then demonstrated a jump in resistivity by further increase of [D2] than 1%. X-ray photoelectron spectroscopy revealed that hydroxyl-bonded oxygen in ITO grew continuingly with [D2]. Deuterium positioned at the interstitial site increased almost quantitatively with increasing [D2]. Rutherford backscattering spectroscopy showed gradual reduction in the oxygen content of ITO with increasing [D2] by 1% and then demonstrated an abrupt increase of the oxygen content with the increase of [D2] than 1%. The films with [D2] < 1% were oxygen deficient, but those with [D2] > 1% were excess of oxygen. The most oxygen deficient film of [D2] = 1% was the most conductive. Behavior in the resistivity with [D2] looks parallel to that in the oxygen content. A lower resistivity of the films corresponded well to oxygen vacancy rather than hydrogen interstitial., source:https://doi.org/10.1016/j.tsf.2011.01.249