1. X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films
- Author
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Patrice Bras, Christian Morawe, Sylvain Labouré, François Perrin, Amparo Vivo, and Raymond Barrett
- Subjects
x-ray optics ,figure correction ,differential deposition ,surface roughness ,film stress ,off-line metrology ,fizeau stitching ,long trace profiler ,magnetron sputtering ,Nuclear and particle physics. Atomic energy. Radioactivity ,QC770-798 ,Crystallography ,QD901-999 - Abstract
Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calculated using a deconvolution algorithm. The surface figure was characterized using conventional off-line visible-light metrology instrumentation (long trace profiler and Fizeau interferometer) before and after the deposition. WSi2 was revealed to be a promising candidate material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm-long flat Si mirror the average height errors were reduced by a factor of 20 down to 0.2 nm root mean square. This result shows the suitability of WSi2 for differential deposition. Potential promising applications include the upgrade of affordable, average-quality substrates to the standards of modern synchrotron beamlines.
- Published
- 2023
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