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X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films
- Source :
- Journal of Synchrotron Radiation, Vol 30, Iss 4, Pp 708-716 (2023)
- Publication Year :
- 2023
- Publisher :
- International Union of Crystallography, 2023.
-
Abstract
- Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calculated using a deconvolution algorithm. The surface figure was characterized using conventional off-line visible-light metrology instrumentation (long trace profiler and Fizeau interferometer) before and after the deposition. WSi2 was revealed to be a promising candidate material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm-long flat Si mirror the average height errors were reduced by a factor of 20 down to 0.2 nm root mean square. This result shows the suitability of WSi2 for differential deposition. Potential promising applications include the upgrade of affordable, average-quality substrates to the standards of modern synchrotron beamlines.
Details
- Language :
- English
- ISSN :
- 16005775
- Volume :
- 30
- Issue :
- 4
- Database :
- Directory of Open Access Journals
- Journal :
- Journal of Synchrotron Radiation
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.141f85541779422d937a254d94e9a396
- Document Type :
- article
- Full Text :
- https://doi.org/10.1107/S1600577523003697