24 results on '"Racette, Kenneth C."'
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2. Low-defect EUVL multilayers on standard format mask blanks
3. Mask Blanks and Their (Sometimes Invisible) Defects
4. Mask availability for next-generation lithography
5. Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
6. Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks
7. Post coat delay effects on chemically amplified resists and storage condition impacts.
8. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
9. Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks
10. Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks.
11. EUVL mask fabrication for the 45-nm node.
12. Mask availability for next-generation lithography.
13. Mask Blanks and Their (Sometimes Invisible) Defects.
14. Low-defect EUVL multilayers on standard format mask blanks.
15. Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks.
16. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications.
17. Next-generation lithography mask development at the NGL-MCOC.
18. Next-generation lithography mask development at the NGL Mask Center of Competency
19. Advanced refractory-metal and process technology for the fabrication of x-ray masks
20. Status of x-ray mask development at the IBM Advanced Mask Facility
21. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
22. Advanced refractory-metal and process technology for the fabrication of x-ray masks.
23. Next-generation lithography mask development at the NGL Mask Center of Competency.
24. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication.
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