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Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications.

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65605953
Full Text :
https://doi.org/10.1117/12.435779