168 results on '"Planar magnetron"'
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2. Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition.
- Author
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Bugaev, A. S., Cherkasov, A. A., Frolova, V. P., Gushenets, V. I., Nikolaev, A. G., Oks, E. M., Savkin, K. P., Shandrikov, M. V., and Vizir, A. V.
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MAGNETRONS , *BORIDING , *SYNCHROTRON radiation , *BORON , *COATING processes , *RADIATION measurements - Abstract
Planar magnetrons with a heated crystalline boron target are promising for depositing boron coatings intended for a wide range of scientific and industrial applications. The promotion of this type of magnetrons requires an in-depth investigation of the coating deposition process. A new version of such a magnetron is created for the vacuum electron-ion-plasma (VEIP) test installation for in situ synchrotron radiation monitoring of the boron coating synthesis. The paper proposes the design and parameters for this magnetron and discusses the boron coating deposition using the VEIP test installation. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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3. Comparison of magnetron sputtering systems for high-rate deposition of thick copper layers for microelectronic applications
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M. V. Nazarenko
- Subjects
magnetron ,liquid phase magnetron ,planar magnetron ,rotatable magnetron ,metal film deposition ,deposition efficiency ,productive methods ,deposition rate ,choice of deposition method ,Information theory ,Q350-390 - Abstract
Objectives. When designing production equipment for the implementation of metal film deposition processes, the selection of technological sources for providing the required quality (structure, appearance), maximum process efficiency, and productivity, poses a challenging task. Since laboratory results often differ from issues faced in production processes, this choice becomes even more difficult under real production conditions due to a lack of sources for comparison. The purpose of the present work is therefore to compare magnetron deposition methods under real industrial conditions (planar extended magnetron, liquid-phase magnetron and cylindrical magnetron with a rotating cathode), identify their advantages and disadvantages along with features of thus-formed metal films, analyze the economic feasibility of each variant, and give practical recommendations for selecting a source when implementing the described process.Methods. Films were deposited using magnetron sputtering system. Roughness was measured using a MarSurf PS1 profilometer. The structure of the films was studied using a Hitachi SU1510 scanning electron microscope. Film thicknesses were measured by X-ray fluorescence analysis using a Fisherscope X-RAY XDV-SDD measuring instrument.Results. Sources of magnetron sputtering for the high-rate deposition of metallization layers under industrial conditions are considered. Obtained samples were compared according to the following criteria: deposition rate while maintaining the required quality, surface defects, film grain size, roughness, uniformity of the deposited layer, deposition efficiency (the ratio of the metal deposited directly onto the substrate to the amount of metal produced during the process). A comparison of the characteristics showed that the deposition rate for the liquid-phase magnetron is commensurate with the similar parameter for the cylindrical magnetron, exceeding the rate for the classical planar magnetron by about 4 times while maintaining the uniform appearance of the samples. The samples deposited with a liquid-phase magnetron had the highest roughness and the largest grain size. Although the cheapest method, liquid-phase magnetron sputtering achieved the lowest sputtering efficiency.Conclusions. The choice of the deposition method depends on the problem to be solved. The rotatable magnetron system can be considered optimal in terms of cost, deposition rate, and quality of the deposited layers. Liquid-phase magnetron sputtering is recommended for low-cost high-speed deposition where there are no strict requirements for appearance, or in case of operation of small-sized equipment.
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- 2022
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4. Planar Magnetron with Electron Injection and Reflective Electrode: Numerical Simulation of Functioning Processes.
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Zolotukhin, D. B.
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MAGNETRONS , *NUMERICAL functions , *COMPUTER simulation , *MAGNETRON sputtering , *ELECTRONS , *ELECTRODES , *GLOW discharges - Abstract
Numerical simulation of the effect of a reflective electrode on the ion composition of the planar magnetron plasma, into the discharge region of which an electron beam with independently controlled electron current and energy is injected, is performed. The numerical simulation results indicate that in such a configuration, higher concentrations of ions of the working gas (argon) and the target cathode (copper) of the magnetron are achieved due to a higher degree of confinement in the region of the plasma generation of injected electrons due to their partial reflection and deflection in the retarding field of the reflective electrode. The simulation results agree satisfactorily with the experimental mass-charge composition of the plasma ions of such a magnetron. [ABSTRACT FROM AUTHOR]
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- 2023
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5. Physical Features of the Functioning of a Planar Magnetron Sputter with a Thermally Insulated, Discharge-Heated Target for Boron Coating Deposition.
- Author
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Vizir, A. V., Nikolaev, A. G., Oks, E. M., Frolova, V. P., Cherkasov, A. A., Shandrikov, M. V., and Yushkov, G. Yu.
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BORIDING , *MAGNETRONS , *PHYSICAL mobility , *MAGNETRON sputtering , *ELECTRIC conductivity , *PLASMA flow , *WORKING gases - Abstract
The design, the principle of operation, and the characteristics of a planar magnetron sputter for pure boron coatings are presented. A feature of this device is the use of a thermally insulated target (cathode) made from pure crystalline boron, which is heated by an auxiliary low-current discharge to provide an electrical conductivity sufficient for the stable functioning of the magnetron discharge. This makes it possible to realize a DC mode and a pulsed self-sputtering mode in the magnetron, where boron ions in the discharge plasma dominate over the working gas ions. Another feature of the magnetron is the use of a slotted anode of a special design, which ensures stable and long-term operation of the device when a non-conductive boron film is applied to the anode surface. When using a pulsed discharge with a peak current of 40 A, a pulse duration of 400 μs, and a pulse repetition rate of 25 pps, the deposition rate of pure boron coatings on a substrate installed at a distance of 10 cm from the cathode is comparable with the deposition rate of the coatings in a DC magnetron discharge with a current of 300 mA and is found to be about 20−30 nm/min. [ABSTRACT FROM AUTHOR]
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- 2022
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6. Modification of the Material Surface by Boron Ions Based on Vacuum Arc Discharge Systems and a Planar Magnetron.
- Author
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Bugaev, A. S., Vizir, A. V., Gushenets, V. I., Nikolaev, A. G., Nikonenko, A. V., Oks, E. M., Savkin, K. P., Frolova, V. P., Shandrikov, M. V., and Yushkov, G. Y.
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ELECTRIC arc , *VACUUM arcs , *SURFACES (Technology) , *MAGNETRONS , *BORON isotopes , *BORON - Abstract
The principle of operation and the characteristics of the experimental equipment intended for the generation of boron ion plasma and beams are presented. The equipment comprises a vacuum arc source of boron ions with boron isotope separation in a magnetic field and a plasma generator for deposition of boron-containing coatings based on a planar magnetron sputter. Common to this equipment is the use of lanthanum hexaboride cathodes, but for planar magnetron, a pure boron cathode heated in the discharge is also used. It is shown that, when silicon wafer is implanted with beams of 10B+ and 11B+ boron isotope ions with doses of 1014–1016 ion/cm2, the isotopic effect of the diode properties of the implanted surface is observed. The results of studies of the properties of the obtained boron-containing coatings on model materials: stainless steel, crystal silicon, and E110 (Zr–1Nb) reactor alloy are presented. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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7. Axial Distribution of the Ion Mass-to-Charge State in a Magnetron Discharge Plasma.
- Author
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Shandrikov, M. V., Artamonov, I. D., Vizir, A. V., Bugaev, A. S., and Oks, E. M.
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PLASMA flow , *MAGNETRONS , *MAGNETRON sputtering , *MASS spectrometers , *COPPER ions , *IONS - Abstract
The axial distribution of the ion mass-to-charge state in planar magnetron plasma has been studied. Copper is used as a target material, and argon was used as an operating gas. To study the ion mass-to-charge state, an upgraded quadrupole mass spectrometer was used. Measurements were carried out along the discharge system axis at a distance of 15 to 45 cm from the magnetron target. The operating pressure in a continuous mode was changed in the range from 1.2·10–3 to 3·10–3 Torr at discharge currents from 100 to 500 ma. It has been shown that at a distance of 15 cm from the magnetron, argon ions predominate in a fractional ratio. At the maximum distance, a significant copper ion fraction is observed. The fraction of argon ions decreases with increase in the discharge current and the operating pressure. [ABSTRACT FROM AUTHOR]
- Published
- 2020
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8. L-band dual-frequency recirculating planar magnetron.
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Zhou, Hao, Li, Tianming, and Li, Shengen
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MAGNETRONS , *GYROTRONS , *PHASE velocity , *PHASE modulation , *ELECTRONIC equipment , *MAGNETRON sputtering , *THERMAL stability , *VACUUM - Abstract
Dual-frequency oscillators have been used in many technical disciplines on account of the phase correlation between two output signals or the feasibility of producing beat wave effect. The mechanism to generate two different-frequency microwave outputs from one magnetron was discussed and simulated. Strapping technique and phase velocity modulation were adopted to generate random frequency ratio and adequate output power. The relationship between phase velocity difference and total output power was investigated and the proper variation range of phase velocity difference was discussed. The conclusion above will accelerate the design flow of dual-frequency magnetron in various frequency demand. A method of optimal E/B distribution was also applied to reduce electron recirculating loss and obtained a notable power enhancement. To fulfill the demand of producing two microwave outputs with a desirable 3:4 frequency ratio in L-band, a conventional vacuum electronic device called Dual-Frequency Recirculating Planar Magnetron (DFRPM) was modeled. There was a significant difference between planar magnetron and cylindrical magnetron, one large shared planar cathode provided better thermal stability and separated the cavity into two slow-wave structures (SWSs), consequently, each SWS arose an oscillation at their own operating frequency. The primary frequencies of two output signals were at 1.30 GHz/1.70 GHz and overcame the frequency ratio limitation happened in other design scheme. [ABSTRACT FROM AUTHOR]
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- 2019
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9. Deposition Processes
- Author
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Mattox, Donald M. and Mattox, Donald M.
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- 2003
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10. Modification of the surface of materials by boron ions based on discharge systems of vacuum arc and planar magnetron
- Author
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A.S. Bugaev
- Subjects
Surface (mathematics) ,Materials science ,chemistry ,Analytical chemistry ,chemistry.chemical_element ,Vacuum arc ,Geotechnical Engineering and Engineering Geology ,Boron ,Planar magnetron ,Ion - Published
- 2020
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11. Device for Growing and Doping in the Growth Process of Thin A1N Films
- Author
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Belyanin, A. F., Semenov, A. P., Spitsyn, B. V., Prelas, Mark A., editor, Gielisse, Peter, editor, Popovici, Galina, editor, Spitsyn, Boris V., editor, and Stacy, Tina, editor
- Published
- 1995
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12. Structure and phase composition of thin TiO films grown on the surface of metallized track-etched polyethylene terephthalate membranes by reactive magnetron sputtering.
- Author
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Artoshina, O., Milovich, F., Rossouw, A., Gorberg, B., Iskhakova, L., Ermakov, R., Semina, V., Kochnev, Yu., Nechaev, A., and Apel, P.
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TITANIUM dioxide films , *POLYETHYLENE , *MAGNETRON sputtering , *SURFACE structure , *METALLIC oxides , *MICROSTRUCTURE - Abstract
We have studied TiO, Ag, Ag/TiO, and Cu/TiO coatings grown on track-etched polyethylene terephthalate membranes. The metals and oxides were deposited by reactive vacuum sputtering using a planar magnetron. The microstructure of the samples were examined by scanning and transmission electron microscopy techniques. The elemental composition of the coatings were determined by energy dispersive X-ray microanalysis, and their phase composition was determined by X-ray diffraction at different temperatures and by transmission electron diffraction. Titanium dioxide can be present on the surface of track-etched membranes (TMs) in three forms: nanocrystals of tetragonal anatase with orthorhombic brookite and amorphous TiO impurities. The copper-metallized TM has been shown to contain cubic CuO. The optical properties of the composite membranes and films have been studied by absorption spectroscopy. The energies of direct and indirect allowed optical transitions have been evaluated from measured absorption spectra of the TiO, Ag/TiO, and Cu/TiO coatings. [ABSTRACT FROM AUTHOR]
- Published
- 2016
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13. Physical Vapor Deposition Under Plasma Conditions
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Konuma, Mitsuharu, Ecker, Günter, editor, Lambropoulos, Peter, editor, Sobelman, Igor I., editor, Walther, Herbert, editor, Lotsch, Helmut K. V., editor, and Konuma, Mitsuharu
- Published
- 1992
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14. L-band dual-frequency recirculating planar magnetron
- Author
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Tianming Li, Shengen Li, and Hao Zhou
- Subjects
010302 applied physics ,Physics ,L band ,business.industry ,General Physics and Astronomy ,Beat (acoustics) ,020206 networking & telecommunications ,02 engineering and technology ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,Optics ,Phase correlation ,0103 physical sciences ,0202 electrical engineering, electronic engineering, information engineering ,Mathematics::Metric Geometry ,Dual frequency ,Electrical and Electronic Engineering ,business ,Planar magnetron ,Wave effect - Abstract
Dual-frequency oscillators have been used in many technical disciplines on account of the phase correlation between two output signals or the feasibility of producing beat wave effect. The mechanis...
- Published
- 2019
- Full Text
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15. Diagnostics of dusty plasma properties in planar magnetron sputtering device
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Qusay A. Abbas
- Subjects
Dusty plasma ,Materials science ,business.industry ,Sputtering ,Optoelectronics ,business ,Planar magnetron - Abstract
The effect of Al dust particles on glow discharge regions, dischargevoltage, discharge current, plasma potential, floating potential,electron density and electron temperature in planar magnetronsputtering device has been studied experimentally. Four cylindricalLangmuir probes were employed to measure plasma parameters atdifferent point on the radial axis of plasma column. The resultsshows the present of Al dust causes to increase the discharge voltageand reduce the discharge current. There are two electron groups inthe present and absent of Al dust particles. The radial profiles ofplasma parameters in the present of dust are non- uniform. Thefloating potential of probe becomes more negatively while theplasma potential becomes positive when the dust immersed intoplasma region. The electron density increases in the present of dustparticle which lead to decreases the electron temperature.
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- 2019
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16. High-current electron gun with a planar magnetron integrated with an explosive-emission cathode.
- Author
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Kiziridi, P.P. and Ozur, G.E.
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ELECTRON gun , *MAGNETRON sputtering , *EXPLOSIVES , *CATHODES , *ELECTRIC potential , *STAINLESS steel - Abstract
A new high-current (up to 25 kA at accelerating voltage of 10–35 kV) electron gun with plasma anode and explosive-emission cathode integrated with a planar pulsed powered magnetron is described. 189 copper wires of 1 mm in diameter and 15 mm in height serve as emitters. Emitters are installed on a stainless steel disc (substrate) with 5-mm distance between them. Planar magnetron is placed just behind the cathode substrate. Magnetron discharge plasma increases ion density on the periphery of plasma anode formed by high-current reflective (Penning) discharge ignited within several milliseconds after the start of magnetron discharge. The ion density increased on the periphery of plasma anode improves the uniformity of high-current electron beam. It was found that new electron gun can operate at working gas (argon) pressures of ∼0.06 Pa which is close to usual values. Preliminary results of testing show that proposed electron gun promises improved uniformity of the beam energy density distribution via its cross-section. [ABSTRACT FROM AUTHOR]
- Published
- 2017
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17. Experiments on the Recirculating Planar Magnetron with Coaxial All-Cavity Extraction
- Author
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Y.Y. Lau, Sunkeerth Tummala, Matthew A. Franzi, Nicholas M. Jordan, Brad W. Hoff, Ronald M. Gilgenbach, Christopher J. Swenson, and Drew A. Packard
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Materials science ,Optics ,business.industry ,Vacuum electronics ,Microwave power ,Extraction (chemistry) ,Code (cryptography) ,Coaxial ,business ,Planar magnetron - Abstract
Calibrated microwave power measurements are presented for the Recirculating Planar Magnetron with Coaxial-All-Cavity Extraction (RPM-CACE). Experimental results are compared with computational predictions using the particle-in-cell code ICEPIC. The RPM-CACE was designed using extensive simulation and optimization to demonstrate the RPM concept, and was simulated to operate at 1.89 GHz and produce peak powers of $\sim 400$ MW at 50-70% efficiency. The experiment utilizes a novel coaxial extraction system to minimize the total diameter of the device.
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- 2020
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18. Synthesis of boron-containing coatings through planar magnetron sputtering of boron targets
- Author
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A.V. Tyunkov, Yu. G. Yushkov, Efim Oks, and Denis B. Zolotukhin
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010302 applied physics ,Materials science ,business.industry ,chemistry.chemical_element ,02 engineering and technology ,Sputter deposition ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Surfaces, Coatings and Films ,chemistry ,Sputtering ,0103 physical sciences ,Boron containing ,Optoelectronics ,0210 nano-technology ,Boron ,business ,Instrumentation ,Planar magnetron ,Research data - Abstract
The paper demonstrates the possibility to synthesize boron-containing coatings through magnetron sputtering of crystalline boron targets at a frequency of several hundred kilohertz, which is much lower compared to rf magnetrons, and presents research data on the surface profile of such coatings deposited in different reactive (air, N2, O2) gases.
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- 2018
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19. Effect of working gas pressure on mass-to-charge composition of plasma ions in high-current planar magnetron discharge
- Author
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A S Klimov, M V Shandrikov, Alexey V. Vizir, E M Oks, and V. P. Frolova
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History ,Materials science ,Gas pressure ,Physics::Plasma Physics ,Analytical chemistry ,Charge (physics) ,Composition (visual arts) ,High current ,Plasma ,Planar magnetron ,Computer Science Applications ,Education ,Ion - Abstract
The mass-to-charge ion composition of a planar magnetron discharge plasma has been investigated. The measurements used a modified quadrupole mass-spectrometer and a time-of-flight spectrometer. The experiments were carried out on a copper magnetron target. Argon was used as a working gas. The operating pressure was 0.15÷1.3 Pa. The discharge current was 1÷20 A with a pulse duration of 30÷50 μs. The influence of main operating parameters (discharge current and working gas pressure) on mass-to-charge composition of plasma ions was measured. The mass-to-charge composition of plasma ions in the axial direction was measured as a function of working pressure. Plasma electron temperature was measured and its effect on the mass-to-charge composition of magnetron plasma ions was estimated.
- Published
- 2021
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20. Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons
- Author
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Richter, F., Welzel, T., Kleinhempel, R., Dunger, T., Knoth, T., Dimer, M., and Milde, F.
- Subjects
- *
SPECTRAL energy distribution , *AZO compounds , *MAGNETRON sputtering , *MAGNETRONS , *ALUMINUM , *ZINC oxide , *OXYGEN - Abstract
Abstract: Ion energy distribution functions (IEDFs) have been measured at the substrate position in magnetron sputtering of an aluminium doped zinc oxide (AZO) target in argon and/or oxygen atmosphere. The IEDFs have been obtained against ground potential with an energy-dispersive ion mass spectrometer which was facing the target surface. Two different magnetron configurations have been investigated: a circular planar magnetron on laboratory scale and an industrial scale rotatable cylindrical magnetron. They were operated with asymmetric-bipolar pulsed d.c. power. Positive ions of the working gas as well as Al+, Zn+, and AlO+ were observed, which show a low-energy peak in their IEDF from the plasma potential of the “on” phase and a high-energy peak of several 10eV which is formed during the “off” phase of the pulsed d.c discharge. Negative ions, being mainly O− from the target, exhibit a strong peak in their IEDF at several 100eV corresponding to the negative target voltage. With strongly varying target voltage in the “on” phase the IEDF may extend to very high energies. Maximum and average energy of both positive and negative ions depend on the discharge power as the voltage in the “on” and “off” phases governing the high-energy ions changes with power. The differently sized planar and rotatable magnetrons exhibit very similar IEDFs for positive as well as negative ions proving that basic physical processes are essentially the same. [Copyright &y& Elsevier]
- Published
- 2009
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21. Solution of the Electron Motion Equations in a Relativistic Planar Magnetron
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I. I. Vintizenko
- Subjects
Physics ,Normalization (statistics) ,Quantum optics ,Nuclear and High Energy Physics ,Relativistic magnetron ,Nuclear Theory ,Astronomy and Astrophysics ,Statistical and Nonlinear Physics ,Physics::Classical Physics ,Electron motion ,Electronic, Optical and Magnetic Materials ,Condensed Matter::Materials Science ,Classical mechanics ,Quantum electrodynamics ,Cavity magnetron ,Electrical and Electronic Engineering ,Planar magnetron - Abstract
We have ascertained the influence of relativism on the processes and output parameters of a relativistic magnetron. The solution of the electron motion equations in a relativistic plane-geometry magnetron is presented. It is shown that these equations have the form corresponding to the nonrelativistic case, where one uses normalization for the static and high-frequency fields.
- Published
- 2017
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22. Damping of longitudinal and shear acoustic waves in a structure with ZnO films with straight and inclined textures
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O. A. Kiryasova, A. G. Veselov, V. I. Elmanov, and Yu. V. Nikulin
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010302 applied physics ,Materials science ,Physics and Astronomy (miscellaneous) ,business.industry ,02 engineering and technology ,Substrate (electronics) ,Acoustic wave ,021001 nanoscience & nanotechnology ,01 natural sciences ,Deposition temperature ,Shear (sheet metal) ,Optics ,Sputtering ,0103 physical sciences ,Composite material ,0210 nano-technology ,business ,Planar magnetron - Abstract
We have reported on the results of an investigation of the damping of longitudinal and shear hyperacoustic waves in Al/ZnO/Al/ZnO/YAG structures (lutetium-doped yttrium–aluminum garnet) based on ZnO piezo-active films with straight and inclined textures, which are synthesized at substrate temperatures T ≈ 25–400°C in an unbalanced planar magnetron sputtering system. It has been shown that anomalously high values of damping up to 45 dB is observed for the passage of acoustic waves through ZnO films with straight textures, which are grown at a substrate temperature T ≈ 200–300°C; an increase in the deposition temperature to T ≈ 400°C leads to a decrease in the introduced acoustic losses by 30–40 dB.
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- 2017
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23. PREDICTION OF THE PLANAR MAGNETRON EROSION ZONE
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N. V. Gorbunov, Yu. A. Kryukov, A. G. Kolesnikov, and T. A. Smolyanin
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Materials science ,Erosion ,General Medicine ,Composite material ,Planar magnetron - Published
- 2020
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24. Diagnostics of plasmas for technological applications
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Turek, Zdeněk, Kudrna, Pavel, and Kousal, Jaroslav
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Dutá katoda ,Langmuirova sonda ,Planar magnetron ,Hollow cathode ,HiPIMS ,Planární magnetron ,Langmuir probe - Abstract
The subject of the master thesis is the extension of the measurement of plasma para- meters by the Langmuir probe in a system with a planar magnetron and a hollow cathode operating in pulse mode. The main tasks are to modify the measuring circuit to increase the maximum probe current and to put the USB oscilloscope into operation for data collection with higher resolution and higher sampling rate. Furthermore, the function of the entire device will be verified using test circuits and also by measuring the probe characteristics in discharges in a system with a magnetron and a hollow cathode in both continuous and pulse mode. 1
- Published
- 2020
25. MgO deposition using reactive ionized sputtering
- Author
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Matsuda, Y., Koyama, Y., Tashiro, K., and Fujiyama, H.
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MAGNESIUM compounds , *SPUTTERING (Physics) - Abstract
We have developed a reactive ionized sputtering system, which composed of a conventional planar magnetron (PM) discharge and inductively coupled plasma (ICP), produced with an internal coil antenna. From the investigation on its discharge properties, we have confirmed that: (1) high density ICP of 1011–1012 cm−3 was successfully produced, (2) the target input power used for sputtering and ICP RF power were independently controllable, (3) the simultaneous operation of PM and ICP were effective for enhancing the ionization, and further excitation of sputtered magnesium atoms. In addition, from the hysteresis observation of reactive sputtering mode, we have confirmed that, the metallic mode sputtering was maintained even for large oxygen flow rate. Preliminary deposition results indicated for the first time that, high crystalline MgO films were deposited at almost the same deposition rate as that of Mg films, under the reactive ionized sputtering condition. [Copyright &y& Elsevier]
- Published
- 2003
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26. Magnetron discharge with azimuthally nonuniform W-Be cathode.
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Elistratov, Nick G. and Zimin, Alexander M.
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- *
MAGNETRONS , *DEUTERIUM , *ION bombardment , *BERYLLIUM , *TUNGSTEN - Abstract
The work presents results of discharge characteristics studies in crossed E-H fields of a planar magnetron filled with deuterium and using different materials of the cathode-target whose secondary ion-electron emission coefficients differ essentially. It was found that voltages at which discharge takes place differ substantially for beryllium and tungsten. The discharge voltage for beryllium cathode is relatively small and varies weakly over a wide range of condition changes. The current-voltage relations (CVR) of a discharge with a tungsten cathode, on the contrary, is "classic"-the discharge voltage is considerably higher and substantially depends on external parameters. The results of magnetron discharges studies with a composite cathode incorporating sectors made of different materials are being presented as well. The authors note that an azimuthal drift in the crossed fields results in an efficient "mixing" of emission electrons knocked-on from different target materials. The dynamics of CVR modification was studied too. Relative redeposition of. sputtered target atoms under operating pressure was revealed experimentally, and a theoretical interpretation of this effect was carried out [ABSTRACT FROM PUBLISHER]
- Published
- 2002
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27. Incoherent Thomson scattering investigations in Hall thruster, planar magnetron and ECR ion source plasmas
- Author
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Vincent, Benjamin, Institut de Combustion, Aérothermique, Réactivité et Environnement (ICARE), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS)-Institut des Sciences de l'Ingénierie et des Systèmes (INSIS), Université d'Orléans, Sedina Tsikata, and VINCENT, Benjamin
- Subjects
[PHYS.PHYS.PHYS-OPTICS] Physics [physics]/Physics [physics]/Optics [physics.optics] ,laser diagnostic ,[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] ,[PHYS.PHYS]Physics [physics]/Physics [physics] ,filtre notch à réseau de Bragg ,diffusion Thomson incohérente ,volume Bragg grating notch filter ,incoherent Thomson scattering ,source d'ion ECR ,ECR ion source ,Hall thruster ,magnétron planaire ,propulseur de Hall ,[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph] ,[PHYS.PHYS.PHYS-PLASM-PH] Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph] ,diagnostic laser ,[PHYS.PHYS] Physics [physics]/Physics [physics] ,planar magnetron - Abstract
Incoherent Thomson Scattering (ITS) is one of the most reliable techniques for determining electron properties inside a plasma. Key information (electron density, temperature (more generally, the EEDF), and drift velocity) can be determined from the analysis of the intensity and spectral distribution of light of a laser pulse scattered by free electrons. In contrast to many conventional techniques, it is non-perturbative, gives access to spatiotemporally-resolved information, and can be applied in magnetized plasma regions. Yet ITS implementation in low-temperature plasmas poses a particular challenge due to the low plasma densities involved.This thesis focuses on the development and application of a new ITS diagnostic.Traditional diagnostics have commonly used triple grating spectrometers to filter the stray light signal (from Rayleigh scattering and laser reflections) in order to allow detection of the Thomson-scattered signal from electrons. Instead, this work uses a recently-commercialized notch filter for stray light reduction. This approach enabled the development of a diagnostic with notable sensitivity and compactness.This diagnostic, named THETIS, was used to gain insights into three low-temperature, magnetized plasmas sources operating at low pressure.A planar magnetron was studied in continuous (DCMS) and pulsed (HiPIMS) regimes, with these investigations allowing the extraction of spatial and temporal profiles of electron properties. This study focused on the influence of the gas type, repetition rate, and magnetic field intensity.A ECR ion source was also studied in pulsed and continuous regimes. The influence of the gas type, pressure and power were investigated. In addition to the study of the dynamics of electron properties in pulsed operation, insights into species excitation and ionization were gained from the analysis of the plasma emission.Lastly, electron properties along radial and azimuthal directions in Hall thrusters in “standard” and “magnetic shielding” configurations were investigated. The influence of the magnetic field intensity, configuration, and direction were investigated, as well as the discharge power and voltage. This work revealed not only the presence of anisotropies in electron properties, but also high electron temperatures in magnetized regions of the thruster plasma and the presence of strongly non-Maxwellian EEDFs in such regions.The information on electron properties, and the accompanying physical insights obtained in this work, contribute to current understanding of these plasmas and provides a new path forward for their modeling and development., La diffusion Thomson incohérente (DTI) est l’une des techniques les plus fiables pour sonder les propriétés électroniques d’un plasma. Des informations clés (densité, température, vitesse de dérive et FDEE) peuvent être obtenues par analyse de l’intensité et de la distribution spectrale de la lumière diffusée sur les électrons libres. Cette technique est non perturbative, permet de bonnes résolutions spatiotemporelles et peut être appliquée dans des régions magnétisées du plasma. Pourtant, l’implémentation de diagnostiques de DTI dans les plasmas bas températures pose un défi en raison des faibles densités plasma.Cette thèse se concentre sur le développement et l’application d’un nouveau diagnostic DTI. Un nouveau type de filtre notch est utilisé pour atténuer la lumière parasite (provenant de la diffusion de Rayleigh et des réflexions laser) et faciliter la détection du signal de diffusion Thomson. Ce composant a permis le développement d’un diagnostic, nommé THETIS, à la fois sensible et compact pour étudier trois sources plasmas magnétisés basse température fonctionnant à basse pression.Un magnétron plan a été étudié en régime continu (DCMS) et pulsé (HiPIMS), ces investigations ont permis l’extraction de profils spatiotemporels des propriétés électroniques. Cette étude s’est concentrée sur l’influence du type de gaz, du taux de répétition et de l’intensité du champ magnétique.Une source d’ions ECR a également été étudiée en régime pulsé et continu. L’influence du type de gaz, de la pression et de la puissance a été étudiée. En plus de l’étude de la dynamique électronique en régime pulsé, l’analyse de l’émission du plasma a permis de suivre les processus d’excitation et ionisation.Enfin, les propriétés électroniques selon les directions radiales et azimutales de propulseurs à effet Hall dans les configurations “standard” et “écrantage magnétique” ont été étudiées. L’influence du champ magnétique et des conditions de décharge ont été étudiées. Ce travail a révélé non seulement la présence d’anisotropies dans les propriétés des électroniques, mais également la présence de forte température dans les régions magnétisées du plasma du propulseur couplées à des FDEE fortement non maxwelliennes.Les résultats des travaux de cette thèse contribuent à la meilleure compréhension de ces plasmas et ouvrent une nouvelle voie pour leur modélisation et développement.
- Published
- 2019
28. Étude de propulseurs de Hall, de magnétrons planaires et de sources d'ions ECR par diffusion Thomson incohérente
- Author
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Vincent, Benjamin, Institut de Combustion, Aérothermique, Réactivité et Environnement (ICARE), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS)-Institut des Sciences de l'Ingénierie et des Systèmes (INSIS), Université d'Orléans, and Sedina Tsikata
- Subjects
laser diagnostic ,[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] ,[PHYS.PHYS]Physics [physics]/Physics [physics] ,filtre notch à réseau de Bragg ,diffusion Thomson incohérente ,volume Bragg grating notch filter ,incoherent Thomson scattering ,source d'ion ECR ,ECR ion source ,Hall thruster ,magnétron planaire ,propulseur de Hall ,[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph] ,diagnostic laser ,planar magnetron - Abstract
Incoherent Thomson Scattering (ITS) is one of the most reliable techniques for determining electron properties inside a plasma. Key information (electron density, temperature (more generally, the EEDF), and drift velocity) can be determined from the analysis of the intensity and spectral distribution of light of a laser pulse scattered by free electrons. In contrast to many conventional techniques, it is non-perturbative, gives access to spatiotemporally-resolved information, and can be applied in magnetized plasma regions. Yet ITS implementation in low-temperature plasmas poses a particular challenge due to the low plasma densities involved.This thesis focuses on the development and application of a new ITS diagnostic.Traditional diagnostics have commonly used triple grating spectrometers to filter the stray light signal (from Rayleigh scattering and laser reflections) in order to allow detection of the Thomson-scattered signal from electrons. Instead, this work uses a recently-commercialized notch filter for stray light reduction. This approach enabled the development of a diagnostic with notable sensitivity and compactness.This diagnostic, named THETIS, was used to gain insights into three low-temperature, magnetized plasmas sources operating at low pressure.A planar magnetron was studied in continuous (DCMS) and pulsed (HiPIMS) regimes, with these investigations allowing the extraction of spatial and temporal profiles of electron properties. This study focused on the influence of the gas type, repetition rate, and magnetic field intensity.A ECR ion source was also studied in pulsed and continuous regimes. The influence of the gas type, pressure and power were investigated. In addition to the study of the dynamics of electron properties in pulsed operation, insights into species excitation and ionization were gained from the analysis of the plasma emission.Lastly, electron properties along radial and azimuthal directions in Hall thrusters in “standard” and “magnetic shielding” configurations were investigated. The influence of the magnetic field intensity, configuration, and direction were investigated, as well as the discharge power and voltage. This work revealed not only the presence of anisotropies in electron properties, but also high electron temperatures in magnetized regions of the thruster plasma and the presence of strongly non-Maxwellian EEDFs in such regions.The information on electron properties, and the accompanying physical insights obtained in this work, contribute to current understanding of these plasmas and provides a new path forward for their modeling and development.; La diffusion Thomson incohérente (DTI) est l’une des techniques les plus fiables pour sonder les propriétés électroniques d’un plasma. Des informations clés (densité, température, vitesse de dérive et FDEE) peuvent être obtenues par analyse de l’intensité et de la distribution spectrale de la lumière diffusée sur les électrons libres. Cette technique est non perturbative, permet de bonnes résolutions spatiotemporelles et peut être appliquée dans des régions magnétisées du plasma. Pourtant, l’implémentation de diagnostiques de DTI dans les plasmas bas températures pose un défi en raison des faibles densités plasma.Cette thèse se concentre sur le développement et l’application d’un nouveau diagnostic DTI. Un nouveau type de filtre notch est utilisé pour atténuer la lumière parasite (provenant de la diffusion de Rayleigh et des réflexions laser) et faciliter la détection du signal de diffusion Thomson. Ce composant a permis le développement d’un diagnostic, nommé THETIS, à la fois sensible et compact pour étudier trois sources plasmas magnétisés basse température fonctionnant à basse pression.Un magnétron plan a été étudié en régime continu (DCMS) et pulsé (HiPIMS), ces investigations ont permis l’extraction de profils spatiotemporels des propriétés électroniques. Cette étude s’est concentrée sur l’influence du type de gaz, du taux de répétition et de l’intensité du champ magnétique.Une source d’ions ECR a également été étudiée en régime pulsé et continu. L’influence du type de gaz, de la pression et de la puissance a été étudiée. En plus de l’étude de la dynamique électronique en régime pulsé, l’analyse de l’émission du plasma a permis de suivre les processus d’excitation et ionisation.Enfin, les propriétés électroniques selon les directions radiales et azimutales de propulseurs à effet Hall dans les configurations “standard” et “écrantage magnétique” ont été étudiées. L’influence du champ magnétique et des conditions de décharge ont été étudiées. Ce travail a révélé non seulement la présence d’anisotropies dans les propriétés des électroniques, mais également la présence de forte température dans les régions magnétisées du plasma du propulseur couplées à des FDEE fortement non maxwelliennes.Les résultats des travaux de cette thèse contribuent à la meilleure compréhension de ces plasmas et ouvrent une nouvelle voie pour leur modélisation et développement.
- Published
- 2019
29. Hybrid deposition of thin film solid oxide fuel cells and electrolyzers
- Author
-
Randich, Erik [Endinboro, PA]
- Published
- 1999
30. Hybrid deposition of thin film solid oxide fuel cells and electrolyzers
- Author
-
Randich, Erik [Endinboro, PA]
- Published
- 1998
31. Cu filling into trenches with Co (00.2) layer by using high-vacuum magnetron sputtering in N2-addded Ar gas
- Author
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Hiroyuki Iida, Masatoshi Itoh, Shigeru Saito, and Yoshio Uhara
- Subjects
Materials science ,Capillary action ,Ultra-high vacuum ,Analytical chemistry ,General Physics and Astronomy ,chemistry.chemical_element ,Surfaces and Interfaces ,General Chemistry ,Sputter deposition ,Condensed Matter Physics ,Nitrogen ,Surfaces, Coatings and Films ,chemistry ,Sputtering ,Planar magnetron - Abstract
We have investigated the relationship between the presence or absence of Co (00.2) layer orientation and the characteristics of Cu filling into trenches. High-vacuum planar magnetron sputtering systems were used in the deposition of Co and Cu. Co-coated substrates with different Co (00.2) layer orientations were used in experiments on Cu filling into trenches of a width of 40 nm and aspect ratio 10. From the results of the Cu filling experiments, Cu filling into trenches was observed in substrates with Co (00.2) layer orientation. Similar Cu filling was also observed in trenches of a width of 20 nm and aspect ratio 4.5. We concentrated on lattice misfit between the Co (00.2) layer and the Cu (1 1 1) layer as the reason why Cu filling occurred in substrates with Co (00.2) layer orientation, and conducted a study from the capillary theory.
- Published
- 2015
- Full Text
- View/download PDF
32. P-52: Morphological and Electrical Difference in C-axis Aligned Crystalline IGZO Films Based on the Sputtering Method
- Author
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Masashi Oota, Masashi Tsubuku, Takuya Kawata, Motoki Nakashima, Koji Dairiki, Noritaka Ishihara, Yoichi Kurosawa, Takako Takasu, and Shunpei Yamazaki
- Subjects
Materials science ,Silicon ,Analytical chemistry ,Oxide ,chemistry.chemical_element ,Sputter deposition ,law.invention ,Crystallinity ,chemistry.chemical_compound ,Oxide semiconductor ,chemistry ,Sputtering ,law ,Crystallization ,Composite material ,Planar magnetron - Abstract
We investigated In-Ga-Zn oxide films deposited by two types of sputtering methods: planar magnetron and facing-target. In crystallinity, we found that silicon diffused from SiOx prevents crystallization regardless of the sputtering method. In electrical property, we found that mobility of films deposited by facing-target sputtering less depends on carrier concentration.
- Published
- 2016
- Full Text
- View/download PDF
33. Extraction of an aluminum-nitride ion beam from a planar magnetron sputter type ion source
- Author
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K. Yoshioka, T. Kenmotsu, and M. Wada
- Subjects
Materials science ,chemistry ,business.industry ,Sputtering ,Aluminium ,Extraction (chemistry) ,Optoelectronics ,chemistry.chemical_element ,Nitride ,business ,Beam (structure) ,Ion source ,Planar magnetron - Published
- 2018
- Full Text
- View/download PDF
34. Sondová diagnostika impulzně generovaného plazmatu
- Author
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Turek, Zdeněk, Tichý, Milan, and Kaňka, Adolf
- Subjects
technology, industry, and agriculture ,Dutá katoda ,Langmuirova sonda ,Planar magnetron ,Hollow cathode ,HiPIMS ,Magnetron ,Langmuir probe - Abstract
The subject of the bachelor thesis is the plasma diagnostics in the planar magnetron and in the hollow cathode system operating in the pulse mode, when the plasma is generated by DC pulses. The diagnostics method used will be the Langmuir probe. The aim of the thesis is the construction of the computer-controlled electronic measuring system and its assessment when measuring the parameters of argon discharge plasma in both systems with time resolution i.e. depending on time during one pulse period.
- Published
- 2018
35. Planar Magnetron Sputtering Device: A New Generation of Magnetron Sputtering Design and Technology
- Author
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I. I. Gadakhabadze, G. G. Dekanozishvili, Z. V. Berishvili, and I. I. Kordzakhia
- Subjects
Materials science ,business.industry ,Sputtering ,Optoelectronics ,Sputter deposition ,business ,Planar magnetron - Published
- 2017
- Full Text
- View/download PDF
36. Recent Research On The Multi-Frequency Recirculating Planar Magnetron
- Author
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Patrick Wong, Ronald M. Gilgenbach, Drew A. Packard, Geoffrey B. Greening, Katherine A. Schneider, Steven C. Exelby, Yue Ying Lau, and Nicholas M. Jordan
- Subjects
Materials science ,Planar ,business.industry ,Optoelectronics ,Electronics ,Voltage pulse ,business ,Microwave ,Planar magnetron ,Magnetic field ,Power (physics) - Abstract
High power microwave sources that are capable of generating multiple frequencies simultaneously are desirable for applications such as counter electronics and vehicle stoppers. The Multi-Frequency Recirculating Planar Magnetron1, an adaptation of the Recirculating Planar Magnetron (RPM)2, has been developed at the University of Michigan to oscillate at 1-GHz as well as 2-GHz. Driven by a -300 kV, $0.3- 1.0 \mu \mathrm {s}$ voltage pulse from MELBA-C, this device has generated peak powers of 44 MW and 21 MW at 1-GHz and 2-GHz, respectively, with a 0.11–0.3 T axial magnetic field.
- Published
- 2017
- Full Text
- View/download PDF
37. Plasma-Based Pulse Shortening In The Recirculating Planar Magnetron
- Author
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Geoffrey B. Greening, Katherine A. Schneider, Drew A. Packard, Ronald M. Gilgenbach, Yue Ying Lau, Steven C. Exelby, and Nicholas M. Jordan
- Subjects
Materials science ,business.industry ,Plasma ,Cathode ,Power (physics) ,Pulse (physics) ,law.invention ,law ,Cavity magnetron ,Object-relational impedance mismatch ,Optoelectronics ,business ,Planar magnetron ,Microwave - Abstract
RF pulse shortening is a long-standing issue in high power microwave (HPM) devices. Several causes have been observed or proposed over the years, including cathode and anode plasma expansion, multipactor RF window breakdown, poor RF contacts, and generator impedance mismatch. In our recirculating planar magnetron (RPM) experiments at the University of Michigan [1], we routinely encounter this phenomenon, and have previously attributed it to expanding cathode plasma, which modifies the synchronism condition and disrupts magnetron operation. Using an ultra-fast intensified 12-frame camera, we have now imaged the plasma formation and evolution within the magnetron. These images provide insight into the probable sources of pulse shortening in the RPM.
- Published
- 2017
- Full Text
- View/download PDF
38. Calculation features of the magnetic and temperature fields of planar magnetron system when sputtering magnetic targets
- Author
-
R. V. Yashkardin and V. D. Goncharov
- Subjects
History ,Materials science ,business.industry ,Sputtering ,Optoelectronics ,business ,Planar magnetron ,Computer Science Applications ,Education - Abstract
Mathematical model for temperature fields calculation in targets of magnetron sputtering systems is described. The paper shows the main ways in which the power supplied to the discharge is removed. The results of numerical simulation of the spatial temperature distribution of a magnetic target are presented. The paper also shows the results of numerical simulation, which allow to link the input power and the shape of the target with the distribution of its temperature. For the obtained temperature distributions magnetic induction distributions are calculated taking into account the loss of magnetic properties of a material when its temperature exceeds the Curie point.
- Published
- 2019
- Full Text
- View/download PDF
39. Reactive sputter deposition of WO3 films by using two deposition methods
- Author
-
Yoji Yasuda, Yoichi Hoshi, Shin-ichi Kobayashi, Hao Lei, Takayuki Uchida, Meihan Wang, and Yutaka Sawada
- Subjects
010302 applied physics ,Materials science ,business.industry ,02 engineering and technology ,Surfaces and Interfaces ,Substrate (electronics) ,Sputter deposition ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Surfaces, Coatings and Films ,Sputtering ,0103 physical sciences ,Oxygen ions ,Optoelectronics ,Thin film ,0210 nano-technology ,business ,Deposition (chemistry) ,Planar magnetron ,Voltage - Abstract
Tungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current.Tungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current.
- Published
- 2019
- Full Text
- View/download PDF
40. Crossed-Field And High-Energy Generators
- Author
-
Harvey, A. F., Connolly, T. F., editor, and Harvey, A. F.
- Published
- 1976
- Full Text
- View/download PDF
41. The Production of Selective Optical Coatings on Plastic Sheet
- Author
-
Howson, R. P., Ridge, M. I., Bishop, C. A., Cottman, G. P., Ehringer, H., editor, and Zito, U., editor
- Published
- 1984
- Full Text
- View/download PDF
42. Additively manufactured structures for high power microwave devices
- Author
-
Geoffrey B. Greening, Steven C. Exelby, Nicholas M. Jordan, Brad W. Hoff, Ronald M. Gilgenbach, and Sabrina S. Maestas
- Subjects
Rapid prototyping ,3d printed ,business.industry ,3D printing ,020206 networking & telecommunications ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Power (physics) ,Anode ,0202 electrical engineering, electronic engineering, information engineering ,Cathode ray ,Optoelectronics ,0210 nano-technology ,business ,Microwave ,Planar magnetron - Abstract
Additive manufacturing techniques, like 3D printing, offer many benefits to the design and manufacture of high power microwave (HPM) components, including the ability to conduct rapid prototyping. A good prototype, however, must be a suitable approximation of the production device. To that end, we have evaluated metallized 3D printed plastic anodes for use in a recirculating planar magnetron [1]. While other authors have examined a metallized plastic structure in an HPM device [2], our work is the first use of a 3D printed structure, and the first where the electron beam impacts the 3D printed anode.
- Published
- 2016
- Full Text
- View/download PDF
43. Automated diagnostics of a magnetron discharge plasma based on atomic molecular emission spectra
- Author
-
A. M. Zimin, S. E. Krivitskiy, S. V. Serushkin, V. M. Gradov, and V. I. Troynov
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,Deuterium ,Cavity magnetron ,Emissivity ,Emission spectrum ,Plasma ,Atomic physics ,Condensed Matter Physics ,Excitation ,Spectral line ,Planar magnetron - Abstract
A software-hardware complex intended for investigating spatial distributions of the plasma spectral emissivity is described. It allows us to record and identify the lines and systems of molecular bands in an automatic mode and to perform computer processing of spectra. Molecular bands of deuterium for different electronic-vibrational-rotational transitions are identified. The excitation temperatures of atomic levels, translational, rotational and vibrational temperatures are estimated for a discharge in a planar magnetron.
- Published
- 2012
- Full Text
- View/download PDF
44. The formation of a plasma anode in a Penning discharge cell combined with a planar magnetron
- Author
-
G. E. Ozur, P. P. Kiziridi, and L. A. Zyul’kova
- Subjects
History ,Materials science ,business.industry ,Optoelectronics ,Plasma ,business ,Planar magnetron ,Computer Science Applications ,Education ,Anode - Published
- 2018
- Full Text
- View/download PDF
45. Ion mass-to-charge ratio in planar magnetron plasma with electron injections
- Author
-
M. V. Shandrikov, Alexey S. Bugaev, G. Yu. Yushkov, Efim Oks, and Alexey V. Vizir
- Subjects
010302 applied physics ,Materials science ,Acoustics and Ultrasonics ,Mass-to-charge ratio ,02 engineering and technology ,Electron ,Plasma ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Calculation methods ,Electronic equipment ,Charged particle ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Ion ,0103 physical sciences ,Atomic physics ,0210 nano-technology ,Planar magnetron - Published
- 2018
- Full Text
- View/download PDF
46. The possibility of using permanent magnets in planar magnetron installations for sputtering magnetic targets
- Author
-
E. M. Fiskin, R. V. Yashkardin, and V. D. Goncharov
- Subjects
Materials science ,business.industry ,Sputtering ,Magnet ,Optoelectronics ,business ,Planar magnetron - Published
- 2018
- Full Text
- View/download PDF
47. The assessment of the ambient-temperature mechanical properties of ultra-fine-grained Ag with nano-twins using microshear tests
- Author
-
P. Geantil, R.S. Rosen, Michael E. Kassner, and Andrea M. Hodge
- Subjects
Materials science ,Mechanical Engineering ,Metallurgy ,Metals and Alloys ,Torsion (mechanics) ,Pure shear ,Condensed Matter Physics ,Mechanics of Materials ,Sputtering ,Nano ,Hardening (metallurgy) ,General Materials Science ,Ultra fine ,Planar magnetron - Abstract
The mechanical properties of ultra-fine-grained (UFG) 150 μm silver interlayers prepared by planar magnetron sputtering were studied using microshear torsion tests. The interlayers have very high ductility in pure shear, comparable to conventional grain sizes, and show a mechanical steady-state. The Hall–Petch behavior at 1.25 μm is consistent with other earlier work. The hardening rates (dσ/de) are substantially higher in the UFG Ag. The saturation stress and strain-rate sensitivity at this stress are identical to coarse-grained silver.
- Published
- 2009
- Full Text
- View/download PDF
48. Collimated Magnetron Sputter Deposition for Mirror Coatings
- Author
-
Anette Vickery, Troels Schønfeldt, Carsten P. Jensen, Finn Erland Christensen, and Mads Peter Steenstrup
- Subjects
Materials science ,business.industry ,Curved mirror ,Surface finish ,Sputter deposition ,engineering.material ,Atomic and Molecular Physics, and Optics ,Collimated light ,Optics ,Coating ,Sputtering ,Cavity magnetron ,engineering ,business ,Instrumentation ,Planar magnetron - Abstract
At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively.
- Published
- 2008
- Full Text
- View/download PDF
49. Simplified model for the DC planar magnetron discharge
- Author
-
Diederik Depla, R. De Gryse, K. Eufinger, G. Buyle, W. De Bosscher, and Johan Haemers
- Subjects
Range (particle radiation) ,Materials science ,Monte Carlo method ,Analytical chemistry ,Electron ,Mechanics ,Sputter deposition ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Ionization ,Cavity magnetron ,Voltage dependence ,Instrumentation ,Planar magnetron - Abstract
We present a model for the DC planar magnetron discharge that separates and simplifies as much as possible the different processes occurring. A crucial part of a magnetron discharge simulation is the motion of the high-energy electrons and the resulting ionisation. This part is usually done by Monte Carlo calculations. We developed an alternative, much faster approach by considering the discharge as being built up by arch-shaped regions. Consequently, the model requires little computing time and, hence, allows to investigate the dependence of the discharge on different external parameters over a wide range. In this article results obtained by our model for calculating the voltage dependence of the cathode sheath and of the erosion profile at constant pressure are shown.
- Published
- 2004
- Full Text
- View/download PDF
50. ZnO–SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targets
- Author
-
Kikuo Tominaga, Kei-ichiro Murai, Kumiko Kondo, H. Fukumoto, Toshihiro Moriga, Yukako Hayashi, and Ichiro Nakabayashi
- Subjects
Materials science ,Electrical resistivity and conductivity ,Sputtering ,Doping ,Analytical chemistry ,Substrate (electronics) ,Condensed Matter Physics ,Instrumentation ,Electrical conductor ,Planar magnetron ,Surfaces, Coatings and Films ,Amorphous solid - Abstract
Thin ZnO–SnO 2 films were deposited on glass substrates by opposed planar magnetron sputtering, in which ZnO and SnO 2 :Sb (Sb 2 O 5 3 wt% doped) targets face each other. Glass substrate temperatures ( T s ) were held at 150°C and 250°C. As an experimental parameter, current ratio δ , ZnO target current divided by the sum of ZnO and SnO 2 target currents, was used. Compositions of as-deposited film were changed with the current ratio δ . Amorphous transparent films appeared over the range of 0.47⩽ δ ⩽0.80 (Zn/(Zn+Sn)=0.28–0.76) at T s =150°C, over the range of 0.33⩽ δ ⩽0.73 (Zn/(Zn+Sn)=0.32–0.66) at T s =250°C. Crystalline ZnSnO 3 and crystalline Zn 2 SnO 4 was not obtained in any of the as-deposited films, even at δ =0.62 (Zn/(Zn+Sn)=1/2) or δ =0.73 (Zn/(Zn+Sn)=2/3). Amorphous films exist as form of (ZnSnO 3 ) 1− x (SnO 2 ) x over the range of 0.50⩽ δ ⩽0.62 (0⩽ x ⩽0.5) and (ZnSnO 3 ) 1− y (ZnO) y over the range of 0.62⩽ δ ⩽0.73 (0⩽ y ⩽0.5). The minimum resistivity of the deposited amorphous films was 3.6 ×10 −2 Ω cm at δ =0.50 (Zn/(Zn+Sn) =0.33), T s =250°C.
- Published
- 2004
- Full Text
- View/download PDF
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