1. Thermal and UV Hydrosilylation of Alcohol-Based Bifunctional Alkynes on Si (111) surfaces: How surface radicals influence surface bond formation
- Author
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Khung, Y, Ngalim, S, Scaccabarozzi, A, Narducci, D, KHUNG, YIT LUNG, SCACCABAROZZI, ANDREA, NARDUCCI, DARIO, Ngalim, SH, Khung, Y, Ngalim, S, Scaccabarozzi, A, Narducci, D, KHUNG, YIT LUNG, SCACCABAROZZI, ANDREA, NARDUCCI, DARIO, and Ngalim, SH
- Abstract
Using two different hydrosilylation methods, low temperature thermal and UV initiation, silicon (111) hydrogenated surfaces were functionalized in presence of an OH-terminated alkyne, a CF 3 -terminated alkyne and a mixed equimolar ratio of the two alkynes. XPS studies revealed that in the absence of premeditated surface radical through low temperature hydrosilylation, the surface grafting proceeded to form a Si-O-C linkage via nucleophilic reaction through the OH group of the alkyne. This led to a small increase in surface roughness as well as an increase in hydrophobicity and this effect was attributed to the surficial etching of silicon to form nanosize pores (∼1-3 nm) by residual water/oxygen as a result of changes to surface polarity from the grafting. Furthermore in the radical-free thermal environment, a mix in equimolar of these two short alkynes can achieve a high contact angle of ∼102°, comparable to long alkyl chains grafting reported in literature although surface roughness was relatively mild (rms = ∼1 nm). On the other hand, UV initiation on silicon totally reversed the chemical linkages to predominantly Si-C without further compromising the surface roughness, highlighting the importance of surface radicals determining the reactivity of the silicon surface to the selected alkynes.
- Published
- 2015