123 results on '"Navarro, Christophe"'
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2. Chapitre 12 : Copolymères à blocs pour la nanolithographie
3. Impact of the architecture on the crystallization kinetics of poly(ε-caprolactone)/poly(trimethylene carbonate) block copolymers
4. Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography
5. Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration
6. Reducing the crystallinity of PCL chains by copolymerization with substituted δ/ε-lactones and its impact on the phase separation of PCL-based block copolymers
7. In situ mid-IR and UV–visible spectroscopies applied to the determination of kinetic parameters in the anionic copolymerization of styrene and isoprene
8. Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application
9. Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers
10. Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
11. Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers
12. Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
13. Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography
14. Block copolymer line roughness measurements via PSD: application to fingerprint samples
15. Procédé de préparation d'un film de copolymère à blocs destiné à la création d'un masque de nanolithographie
16. Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
17. Integration and pattern transfer of silicon-containing high-χ block copolymers
18. Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
19. Evaluation of adhesion layers performances for soft UV nanoimprint lithography
20. Microphase Separation of Polybutyrolactone-Based Block Copolymers with Sub-20 nm Domains
21. Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
22. Inorganic guiding template implementation for DSA contact hole shrink process (Conference Presentation)
23. Pillars fabrication by DSA lithography: material and process options
24. Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
25. Evaluation of anti-sticking layers performances for 200mm wafer scale smart NILTM process through surface and defectivity characterizations
26. An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly
27. Evaluation of adhesion layers performances for soft UV nanoimprint lithography.
28. Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
29. Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning
30. Use of sequential infiltration synthesis to improve the pattern transfer of PS-b-PLA DSA (Conference Presentation)
31. Advanced surface affinity control for DSA contact hole shrink applications
32. Sequential Infiltration of Self-Assembled Block Copolymers: A Study by Atomic Force Microscopy
33. Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning
34. Block copolymer line roughness measurement via PSD: application to fingerprint samples
35. Evaluation of anti-sticking layers performances for 200 mm wafer scale Smart NILTM process through surface and defectivity characterizations.
36. Copolymers with polar and non-polar olefin blocks
37. Process highlights to enhance directed self-assembly contact patterning performances
38. Surface affinity role in graphoepitaxy of lamellar block copolymers
39. Advanced Formulation for DSA Resists
40. Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers
41. (0) Save to: more options Facile and versatile synthesis of rod-coil poly(3-hexylthiophene)-based block copolymers by nitroxide-mediated radical polymerization
42. Assessing the Local Nanomechanical Properties of Self-Assembled Block Copolymer Thin Films by Peak Force Tapping
43. Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers
44. PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication
45. Contact holes patterning by directed self-assembly of block copolymers: process window study
46. Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers
47. Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films
48. Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy
49. Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
50. Selective O-acyl ring-opening of β-butyrolactone catalyzed by trifluoromethane sulfonic acid: application to the preparation of well-defined block copolymers
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