Search

We present THz quantum cascade emitters realized on a Si substrate. The emission centered at 3.4 and 4.9 THz originates from L-valley transitions in strain-compensated n-Type Ge/SiGe heterostructures. This is an important step towards the realization of Si-based THz quantum cascade lasers.

The Quantum Cascade Laser (QCL) has been demonstrated in polar III-V semiconductor materials employing transitions between conduction band states [1] . Harnessing intersubband transitions allows lasing at mid-infrared and far-infrared wavelengths. Buried InGaAs/InAlAs QCLs unlocked the mid-infrared application space, because they are operational at room-temperature and in continuous wave [2] . However, THz QCLs remain limited up to 250 K in pulsed operation with a large dissipation [3] . The quenching of the laser emission is related to ther-mally activated LO phonon emission in polar materials. Exploiting intersubband transitions in non-polar group IV materials with weaker electron-phonon interaction is an exciting approach to realize a Si-based THz QCL and to eventually elevate the operation temperature [4] .

The theory of interface roughness scattering is well established in the case of idealized abrupt interfaces. Here we generalize this theory for finite interfacial widths. Experimental findings for Ge/GeSi interfaces show that the interface roughness can be correlated along the growth directions at length scales smaller than the interfacial width. This feature is included in a generalized theory of interface roughness scattering, accounting for correlations along both in-plane and out-of-plane directions. This model is included in a nonequilibrium Green’s functions simulator, allowing to assess the impact of interface roughness on the performances of quantum cascade lasers.

We report electroluminescence at 14meV and 20meV from a n-type Ge/Si0.15Ge0.85 quantum cascade heterostructure on Si substrate grown by ultra-high vacuum chemical vapour deposition. The electroluminescence signal of the single quantum well active region design, extracted through diffraction gratings from mesa structures, is compared with its GaAs counterpart.The spectral features agree well with modeling based on Non-equilibrium Green's function calculations. The observed electroluminescence peaks show a full width at half maximum of 3meV and 4meV. These results are an important step towards the realization of an n-type THz quantum cascade laser on a non-polar material system.

High-quality n-type continuously graded Ge-rich Si1−xGex parabolic quantum wells with different doping level were grown by using ultrahigh-vacuum chemical vapor deposition on Si(001) substrates. A thorough structural characterization highlights an ideal parabolic compositional profile. THz intersubband absorption has been investigated in modulation-doped samples and samples directly doped in the wells. The comparison of experimental absorption data and theoretical calculations allowed us to quantify the impact of electron correlation effects on the absorption resonances in the different doping conditions and for electron sheet densities in the (1÷6)×1011 cm−2 range. A single optical resonance is present in modulation doped samples. Its peak energy and line-shape is independent of temperature-induced variations of the electron distribution in the subbands up to 300 K, in agreement with the generalized Kohn theorem. This achievement represents a relevant step-forward for the development of CMOS compatible optoelectronic devices in the THz spectral range, where thermal charge fluctuations play a key role.

© 2021 Author(s). We report electroluminescence originating from L-valley transitions in n-type Ge/Si0.15Ge0.85 quantum cascade structures centered at 3.4 and 4.9 THz with a line broadening of Δ f / f ≈ 0.2. Three strain-compensated heterostructures, grown on a Si substrate by ultrahigh vacuum chemical vapor deposition, have been investigated. The design is based on a single quantum well active region employing a vertical optical transition, and the observed spectral features are well described by non-equilibrium Green's function calculations. The presence of two peaks highlights a suboptimal injection in the upper state of the radiative transition. Comparison of the electroluminescence spectra with a similar GaAs/AlGaAs structure yields one order of magnitude lower emission efficiency. ISSN:0003-6951 ISSN:1077-3118

Combining scanning tunneling microscopy and angle-resolved photoemission spectroscopy, we demonstrate how to tune the doping of epitaxial graphene from p to n by exploiting the structural changes that occur spontaneously on the Ge surface upon thermal annealing. Furthermore, using first-principle calculations, we build a model that successfully reproduces the experimental observations. Since the ability to modify graphene electronic properties is of fundamental importance when it comes to applications, our results provide an important contribution toward the integration of graphene with conventional semiconductors.

n-type Ge/SiGe asymmetric coupled quantum wells represent the building block of a variety of nanoscale quantum devices, including recently proposed designs for a silicon-based THz quantum cascade laser. In this paper, we combine structural and spectroscopic experiments on 20-module superstructures, each featuring two Ge wells coupled through a Ge-rich SiGe tunnel barrier, as a function of the geometry parameters of the design and the P dopant concentration. Through a comparison of THz spectroscopic data with numerical calculations of intersubband optical absorption resonances, we demonstrated that it is possible to tune, by design, the energy and the spatial overlap of quantum confined subbands in the conduction band of the heterostructures. The high structural/interface quality of the samples and the control achieved on subband hybridization are promising starting points towards a working electrically pumped light-emitting device.

In this paper we have deposited structures comprising a stack of 10 periods made of 15 nmthick Ge multi quantum well (MQW) enclosed in 15 nm-thick Si0.2Ge0.8 barrier have been deposited on SiGe virtual substrates (VS) featuring different Ge contents in the 85% - 100% Ge range to investigate the influence of heteroepitaxial strain on the Si0.2Ge0.8 and Ge growth. With increasing Ge concentration of the VS, growth rate of the Si0.2Ge0.8 in the MQW increases. Si incorporation into the Si0.2Ge0.8 layer becomes also slightly higher. However, almost no influence of the growth rate is observed for Ge growth in the MQW. We argue that the increased tensile strain promotes the Si reaction at the surface. In the case of the Si0.2Ge0.8 growth on Ge, we observe a smeared interface due to the Ge segregation during the growth. Furthermore, we observe that this interface width increases with increasing Ge concentration of VS. We attribute this observation to the increased segregation of Ge driven by the increased strain energy accumulated in the in the Si0.2Ge0.8 layers. We also observed that the MQW layer “filters-out” threading dislocations formed in the VS.

n-type doped Ge quantum wells with SiGe barriers represent a promising heterostructure system for the development of radiation emitters in the terahertz range such as electrically pumped quantum cascade lasers and optically pumped quantum fountain lasers. The nonpolar lattice of Ge and SiGe provides electron&ndash, phonon scattering rates that are one order of magnitude lower than polar GaAs. We have developed a self-consistent numerical energy-balance model based on a rate equation approach which includes inelastic and elastic inter- and intra-subband scattering events and takes into account a realistic two-dimensional electron gas distribution in all the subband states of the Ge/SiGe quantum wells by considering subband-dependent electronic temperatures and chemical potentials. This full-subband model is compared here to the standard discrete-energy-level model, in which the material parameters are limited to few input values (scattering rates and radiative cross sections). To provide an experimental case study, we have epitaxially grown samples consisting of two asymmetric coupled quantum wells forming a three-level system, which we optically pump with a free electron laser. The benchmark quantity selected for model testing purposes is the saturation intensity at the 1&rarr, 3 intersubband transition. The numerical quantum model prediction is in reasonable agreement with the experiments and therefore outperforms the discrete-energy-level analytical model, of which the prediction of the saturation intensity is off by a factor 3.

We study radiative relaxation at terahertz frequencies in n-type Ge/SiGe quantum wells, optically pumped with a terahertz free electron laser. Two wells coupled through a tunneling barrier are designed to operate as a three-level laser system with non-equilibrium population generated by optical pumping around the 1→3 intersubband transition at 10 THz. The non-equilibrium subband population dynamics are studied by absorption-saturation measurements and compared to a numerical model. In the emission spectroscopy experiment, we observed a photoluminescence peak at 4 THz, which can be attributed to the 3→2 intersubband transition with possible contribution from the 2→1 intersubband transition. These results represent a step towards silicon-based integrated terahertz emitters.

Exploiting intersubband transitions in Ge/SiGe quantum cascade devices provides a way to integrate terahertz light emitters into silicon-based technology. With the view to realizing a Ge/SiGe Quantum Cascade Laser, we present the optical and structural properties of n-type strain-symmetrized Ge/SiGe asymmetric coupled quantum wells grown on Si(001) substrates by means of ultrahigh vacuum chemical vapor deposition. We demonstrate high material quality of strain-symmetrized structures and heterointerfaces as well as control over inter-well coupling and electron tunneling. Motivated by the promising results obtained on ACQWs, which are the basic building block of a cascade structure, we investigate, both experimentally and theoretically, a Ge/SiGe THz QCL design, optimized through a non-equilibrium Green’s function formalism

The imaging and sensing technology operating in the THz region of the electromagnetic spectrum has a number of applications, with demonstrator products already available on the market for oncology imaging, production monitoring, and non-destructive test [1]. However, the THz sources now at hand are still bulky and too expensive for expanding this technology to other proposed applications, which also include, among other, THz bandwidth photonics and security imaging. A higher level of integration with control electronics, a lower production cost, and a broader wavelength range of emission towards the far-infrared, are all desirable features to expand the fields of application of THz radiation. N-type Ge/SiGe quantum cascade structures grown on top of a Si(001) substrate are particularly promising for realizing a Si based THz source [2]. The low effective mass and long non-radiative relaxation times due to the non-polar nature of the material, are expected to i) provide gain values close to those demonstrated in III-V quantum cascade structures at 4 K, and ii) to potentially enable 300 K operation. In this presentation we will discuss the optical and structural properties of n-type s-Ge/SiGe multi-quantum wells and asymmetric coupled quantum wells grown on Si(001) substrates by means of ultrahigh vacuum chemical vapor deposition [3]. Extensive structural characterization obtained by scanning transmission electron microscopy (STEM), atomic probe tomography (APT) and X-ray diffraction shows the high material quality of strain-symmetrized structures (up to 5 micron active region thickness) and heterointerfaces (featuring interface roughness below 0.2 nm), down to the ultrathin barrier limit (about 1 nm). By performing THz absorption spectroscopy measurements combined to theoretical modeling on different asymmetric coupled quantum well systems (with varying large-well width or barrier thickness), we unambiguously demonstrated inter-well coupling and wavefunction tunneling [3]. The agreement between experimental data and simulations allowed us to characterize the tunneling barrier parameters and, in turn, achieve a highly-controlled engineering of the electronic structure in forthcoming unipolar cascade systems based on n-type Ge/SiGe multi quantum-wells. Furthermore, by pump-and-probe, and time domain spectroscopic data with a thorough theoretical modeling, we will show that this material system is indeed promising as active material in quantum cascade lasers (QCL). We found i) narrow intersubband (ISB) absorption lines; ii) relatively long non-radiative ISB relaxation times at high temperature; iii) relaxation times for different ISB transitions favorable to population inversion. Leveraging on the promising results obtained by spectroscopy experiments, we theoretically investigate an electrically-pumped Ge/SiGe THz QCL through a non-Equilibrium Green Function formalism (nextnano.QCL), using as material parameters to model the scattering processes the values estimated from the analysis of the optical experimental data [4]. As expected, due to the weaker interaction with the phonon field with respect to III-V based devices, we find a lower impact of the temperature on the gain spectrum. In addition, simulations show that the interface roughness values measured on our samples allows to achieve gain overcoming the losses of double-metal waveguides at room temperature. We believe that the present results will motivate new experimental efforts aimed at demonstrating room-temperature operation in group IV QCL THz devices. References [1] D. J. Paul, Laser Photon. Rev. 4, 610 (2010). [2] K. Driscoll, and R. Paiella, J. Appl. Phys. 102, 093103 (2007). [3] C. Ciano, M. Virgilio, M. Montanari, L. Persichetti, L. Di Gaspare, M. Ortolani, L. Baldassarre, M. H. Zollner, O. Skibitzki, G.Scalari, J. Faist, D. J. Paul, M. Scuderi, G. Nicotra, T. Grange, S. Birner, G. Capellini, and M. De Seta, Accepted in Phys. Rev. Appl., 11, 014003 (2019). [4] T. Grange, D. Stark, G. Scalari, J. Faist, L. Persichetti, L. Di Gaspare, M. De Seta, M. Ortolani, D.J. Paul, G. Capellini, S. Birner and M. Virgilio, Submitted to Applied Physics Letters. Preprint available at https://arxiv.org/pdf/1811.12879.pdf.

By tuning the growth parameters, we show that it is possible to drive the CVD synthesis of graphene on Ge(110) towards the formation of either ultrathin armchair nanoribbons or of continuous graphene films. The ribbons are aligned along specific high-symmetry directions of the Ge(110) surface and have a width of ~5 nm. Moreover, by merging spectroscopic and morphological information, we find that the quality of graphene films depends critically on the growth temperature improving significantly in a narrow range close to the Ge melting point. The abruptness of the temperature behavior observed indicates that achieving high-quality graphene is intimately connected to the quasi-liquid Ge layer formed close to 930 °C on the substrate. Being observed for diverse Ge orientations, this process, known as incomplete melting, is shown to be of general relevance for graphene synthesis on Ge, and explains why similar growth conditions present in literature lead to graphene of very diverse quality on these substrates.

The efficient integration of electronic and optoelectronic functions on a single chip within a CMOS-compatible material and technology platform is witnessing the next disruptive innovation in the microelectronics industry. Among the proposed approaches to “siliconize” photonics, the most ambitious is to develop a monolithic Si-based light source. The main challenge is the indirect bandgap of Si which hinders efficient light emission. A number of different solutions has been suggested to break down this material limitation, and the optimal strategy depends on the specific spectral range of application. In the THz range, quantum cascade laser (QCL) architectures based on the Group-IV material system have been predicted as viable potential sources up to room temperature1-3, by exploiting intersubband (ISB) transitions in the conduction band of n-type, Ge-rich Ge/SiGe multi-quantum well (MQW) heterostructures3. In this paper, we will show that the interface quality and threading dislocation density4 in this material system have finally reached the level required for possibly enabling, within a wide temperature range, a material gain larger than the cavity losses5. From the structural standpoint, we report on the growth by ultra-high-vacuum chemical vapor deposition (UHV-CVD) of strain-compensated QCL stacks with a thickness up to 10 µm, demonstrating by X-ray diffraction and scanning transmission electron microscopy their high crystalline quality and remarkable growth reproducibility [Fig. 1(a)]. We will also describe optimized designs obtained in waveguide modelling with which waveguide losses comparable to III-V architectures are achieved6. In the model system of n-type Ge-rich asymmetric coupled quantum wells (ACQWs)7,8, being the building block of a QCL structure, we will prove a high degree of control on the engineering at the nanoscale the intersubband electronic spectrum and the wavefunctions relevant for tunneling processes, which allowed us the observation of photoluminescence at 4 THz after optical excitation using a free-electron laser (FEL)9. In addition, we will present a systematic calibration study of the material parameters controlling the interface roughness (IFR) and electron-phonon scatterings in n-type Ge/SiGe MQWs by combining experimental pump-probe data with a numerical model of ISB carrier dynamics including inelastic and elastic scattering channels. The time evolution of subband populations after FEL optical pumping is investigated as a function of the MQW design geometry, comparing symmetric and stepwise configurations, and analyzed by varying the subband energy spacing changing the well width. As a matter of fact, these material parameters critically affect the outcomes of the non-equilibrium Green’s function calculations widely used for predicting quantum transport and, ultimately optical gain of QCL devices10,11 and so to guide the optimization of proposed device designs. Hitherto, however, in most cases, the adopted values for these material parameters were not calibrated against experiments. For a proper calibration of the deformation potentials, we studied the non-radiative lifetimes as a function of the subband spacing on a set of symmetric MQWs of different Ge well widths. The corresponding α2D absorption spectra are reported in the left panels Fig. 1(b-d). Differential transmission spectra from single-color pump-probe experiments and model simulations indicate [Fig. 1(e-g)] that the electron-phonon coupling is much less effective than that expected from the bulk deformation potentials reported by Jacoboni et al.12. In particular, we found that the relaxation mediated by the emission of intervalley OPs is suppressed in low-dimensional multilayer structures while the intravalley OP scattering is described by a reduced effective deformation potential, thus explaining the observation of relaxation times larger than 10 ps above both the OP energy thresholds in single-color pump probe spectroscopy experiments. These results are crucial for developing adequate simulation frameworks and specific design approaches for achieving optical gain in silicon-compatible quantum cascade emitters. [1] K. Driscoll et al., Appl. Phys. Lett. 89, 191110 (2006). [2] K. Driscoll et al., J. Appl. Phys. 102, 093103 (2007). [3] D. J. Paul, Laser & Photonics Reviews 4, 610 (2010). [4] T. Grange et al., Physical Review Applied 13, 044062 (2020). [5] T. Grange et al., Appl. Phys. Lett. 114, 111102 (2019). [6] K. Gallacher et al., Opt. Express 28, 4786 (2020). [7] C. Ciano et al., Physical Review Applied 11, 014003 (2019). [8] L. Persichetti et al., Crystals 10, 179 (2020). [9] C. Ciano et al., Opt. Express 28, 7245 (2020). [10] A. Valavanis et al., Phys. Rev. B 83, 195321 (2011). [11] C. Jirauschek et al., Applied Physics Reviews 1, 011307 (2014). [12] C. Jacoboni et al., Phys. Rev. B 24, 1014 (1981). Figure 1

Regular surface undulations, called cross-hatch patterns, appearing at the free surface of lattice-mismatched heteroepitaxial films are a key signature of plastic relaxation. Here we show that the dynamics of cross-hatch formation is accurately described by a continuum model based on strain-mediated surface diffusion, provided that a realistic distribution of dislocations is considered. We demonstrate quantitative agreement between our time-dependent simulations and dedicated atomic force microscopy experiments on ${\mathrm{Si}}_{0.92}{\mathrm{Ge}}_{0.08}$ films grown on Si(001) at various thicknesses, finally shedding light on the origin and on the dynamical behavior of a widely investigated pattern, first observed more than half a century ago.

By combining scanning probe microscopy with Raman and x-ray photoelectron spectroscopies, we investigate the evolution of CVD-grown graphene/Ge(001) as a function of the deposition temperature in close proximity to the Ge melting point, highlighting an abrupt change of the graphene's quality, morphology, electronic properties and growth mode at 930 degrees. We attribute this discontinuity to the incomplete surface melting of the Ge substrate and show how incomplete melting explains a variety of diverse and long-debated peculiar features of the graphene/Ge(001), including the characteristic nanostructuring of the Ge substrate induced by graphene overgrowth. We find that the quasi-liquid Ge layer formed close to 930 degrees is fundamental to obtain high-quality graphene, while a temperature decrease of 10 degrees already results in a wrinkled and defective graphene film., in press

We investigate the distribution of Sn in GeSn nano-heteroepitaxial clusters deposited at temperatures well exceeding the eutectic temperature of the GeSn system. The 600 °C molecular beam epitaxy on Si-patterned substrates results in the selective growth of GeSn nano-clusters having a 1.4 ± 0.5 at% Sn content. These nano-clusters feature Sn droplets on their faceted surfaces. The subsequent deposition of a thin Ge cap layer induced the incorporation of the Sn atoms segregated on the surface in a thin layer wetting the nano-dots surface with 8 ± 0.5 at% Sn. The presence of this wetting layer is associated with a relatively strong photoluminescence emission that we attribute to the direct recombination occurring in the GeSn nano-dots outer region.

We provide an in-depth characterization of the dislocation distribution in partially relaxed Si0.92Ge0.08/Si(001) films. This is achieved by an innovative and general method, combining two state-of-the-art characterization techniques through suitable modeling. After having inferred the dislocation positions from transmission-electron-microscopy images, we theoretically reproduce scanning-x-ray-diffraction-microscopy tilt maps measured on the very same region of the sample. We obtain a nearly perfect match between model predictions and experimental data. As a result, we claim that it is possible to establish a local, direct correlation between the dislocations revealed by the transmission-electron-microscopy analysis and the measured lattice tilt distribution.

Asymmetric coupled quantum wells in the conduction band of germanium grown on silicon wafers have been investigated by THz pump-THz broadband probe picosecond spectroscopy. The optically-pumped laser gain coefficient is estimated.

Asymmetric quantum well systems are excellent candidates to realize semiconductor light emitters at far-infrared wavelengths not covered by other gain media. Group-IV semiconductor heterostructures can be grown on silicon substrates, and their dipole-active intersubband transitions could be used to generate light from devices integrated with silicon electronic circuits. Here, we have realized an optically pumped emitter structure based on a three-level Ge/Si0.18Ge0.82 asymmetric coupled quantum well design. Optical pumping was performed with a tunable free-electron laser emitting at photon energies of 25 and 41 meV, corresponding to the energies of the first two intersubband transitions 0 → 1 and 0 → 2 as measured by Fourier-transform spectroscopy. We have studied with a synchronized terahertz timedomain spectroscopy probe the relaxation dynamics after pumping, and we have interpreted the resulting relaxation times (in the range 60 to 110 ps) in the framework of an out-of-equilibrium model of the intersubband electron−phonon dynamics. The spectral changes in the probe pulse transmitted at pump−probe coincidence were monitored in the range 0.7−2.9 THz for different samples and pump intensity and showed indication of both free carrier absorption increase and bleaching of the 1 → 2 transition. The quantification from data and models of the free carrier losses and of the bleaching efficiency allowed us to predict the conditions for population inversion and to determine a threshold pump power density for lasing around 500 kW/cm2 in our device. The ensemble of our results shows that optical pumping of germanium quantum wells is a promising route toward siliconintegrated far-infrared emitters.

We analyze the linewidth of intersubband absorption features observed in n-type s-Ge/Ge0.82Si0.18 multiquantum wells grown on Si(001) substrates. Supported by a thorough theoretical modeling, we discuss the role on the line broadening of electron scattering due to interface roughness, spatial distribution and density of ionized donors, phonons, alloy disorder, and extended defects. To this aim, the absorption spectra of a set of samples featuring different well widths and doping profiles are measured obtaining a very good agreement with the theoretical results. We demonstrate values of the half width at half maximum of the E0->E1 absorption peak as small as 2 meV. Our analysis suggests that the coherence time of electron wave functions in n-doped Ge/SiGe quantum wells is not yet limited by intrinsic scattering mechanisms up to room temperature, opening new perspectives for the quantum design of silicon-based light emitting devices.

In this paper, we have experimentally and numerically studied the nonradiative intersubband (ISB) relaxation in $n$-type Ge/SiGe quantum well (QW) systems. Relaxation times have been probed by means of pump-probe experiments. An energy balance model has been used to interpret the experimental differential transmission spectra and to assess the relevance in the nonradiative relaxation dynamics of both electron and lattice temperature as well as of the carrier density. The comparison between experimental data and theoretical simulation allowed us to calibrate the interaction parameters which describe the electron-optical phonon scattering in two-dimensional (2D) Ge systems. Characteristic relaxation times has been calculated and compared with those of GaAs QWs as a function of the 2D electron density, of the subband energy separation, and of the lattice and electronic temperature. We found that ISB relaxation times for the Ge/SiGe systems are generally shorter than that previously calculated when the electron distribution was neglected. Nonetheless, our main result is that the relaxation time in Ge/SiGe QW systems is longer than 10 ps, also for transition energies above the Ge optical phonon energy, up to 300 K. Furthermore, we obtained that the relaxation times are at least one order of magnitude longer than in GaAs-based systems.

""\\"We present a synergic experimental and theoretical investigation of the plastic relaxation onset in low-temperature Ge growth on Si(001). High-resolution transmission electron microscopy reveals that misfit is released by pairs of coupled 60° dislocations. Atomic resolution proved to be key in distinguishing pairs from single 90°dislocations because of the revealed small intra-pair dislocation distance (even less than 1 nm). By exploiting dislocation theory and molecular dynamics simulations, we demonstrate that the observed pairing naturally occurs as a result of the mutual interactions between the two dislocations. In particular, analytical models show that the stress field arising in a thin film when a dislocation segment lies at the interface with the substrate determines the most favored nucleation site for a new (complementary) dislocation that leads, after migration, to the coupling with the first in a stable position. At the growth temperature, further motion or recombination due to atomic scale effects is excluded by classical molecular dynamics simulations. A clear picture of the early stages in the strain relaxation emerges, gliding out of the interface and\\\\\\\/or short-range climbing (as typically produced by annealing or higher temperature steps, but not taking place under the present growth conditions) being required to transform pairs into a single edge dislocations. The present results also offer answers to the long-held puzzling question about the mechanism originating 90° dislocation in high mismatch Ge\\\\\\\/Si systems. \\"""

""We report on the experimental and theoretical investigation of the relaxation in Ge-rich SiGe\\\/Ge\\\/Si heterostructures. The experimental x-ray diffraction data are interpreted with the help of a model including both edge and 60 degrees misfit dislocations in the calculated x-ray scattering intensity. Our results show that highly positionally correlated edge dislocations dominate in the relaxation of the compressive strain at the Ge\\\/Si interface, while a smaller tensile strain at the SiGe\\\/Ge interfaces released by uncorrelated\\\/little correlated 60 degrees dislocations.""

We measured the non-radiative intersubband relaxation time in n-type modulation-doped Ge/SiGe multi-quantum wells of different thickness by means of degenerate pump-probe experiments. The photon energy was tuned to be resonant with the lowest conduction band intersubband transition energy (14-29 meV), as measured by terahertz absorption spectroscopy and in agreement with band structure calculations. Temperature-independent lifetimes in excess of 30 ps were observed. © 2011 American Institute of Physics.

Novel silicon photonics applications requiring heavy n-type doping have recently driven a great deal of interest towards the phosphorous doping of germanium. In this work we report on infrared reflectance spectroscopy measurements of the electron density in heavily n-type doped germanium layers obtained by stacking multiple phosphorous δ-layers. Here, we demonstrate that the conventional Drude model of the electrodynamic response of free carriers in metals can be adapted to describe heavily doped semiconductor thin films. Consequently, the effect of the electron density on the plasma frequency, scattering rate and complex permittivity can be investigated.

not Available.

Second-harmonic generation (SHG) is a direct measure of the strength of second-order nonlinear optical effects, which also include frequency mixing and parametric oscillations. Natural and artificial materials with broken center-of-inversion symmetry in their unit cell display high SHG efficiency, however the silicon-foundry compatible group-IV semiconductors (Si, Ge) are centrosymmetric, thereby preventing full integration of second-order nonlinearity in silicon photonics platforms. Here we demonstrate strong SHG in Ge-rich quantum wells grown on Si wafers. The symmetry breaking is artificially realized with a pair of asymmetric coupled quantum wells (ACQW), in which three of the quantum-confined states are equidistant in energy, resulting in a double resonance for SHG. Laser spectroscopy experiments demonstrate a giant second-order nonlinearity at mid-infrared pump wavelengths between 9 and 12 microns. Leveraging on the strong intersubband dipoles, the nonlinear susceptibility almost reaches 10^5 pm/V, Comment: 30 pages, 6 figures, double line spacing