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1. Development Strategy of Microbial Industry in China

3. Discharge characteristics of optical pumping source by ceramic surface discharge

12. Automatic alignment of multiplexed beams of excimer laser system based on fluorescence imaging

13. A Mid-Infrared Pulsed HF Chemical Laser with 100 Hz Repetition Rate

14. Theoretical Analysis of Energy Stability of Repetitively Pulsed HF Laser

16. 200 µJ, 13??ns Er:ZBLAN mid-infrared fiber laser actively Q-switched by an electro-optic modulator

18. Optical design of high power excimer laser system

19. Electrically initiated repetitive-pulsed non-chain HF lasers

20. Characteristics of SF6 discharge in nonchain HF laser

21. Discharge pumped repetition-rate non-chain HF laser

22. Operation stability of repetitively pulsed optical pumping sources

23. Technology of XeF blue-green laser with repetitive rate

24. Output Spectral Characteristics of Discharge Initiated Non-Chain Pulsed HF Laser

25. Study on the Spectrum of XeF Laser

26. Spectral-narrowing of XeF(C-A) blue-green laser

30. Development of optically pumped XeF laser technology in NINT

31. Time Characterization of High Density Gas Jet from a Pulsed Supersonic Nozzle via Laser Produced Plasma

32. Design and effects evaluation of pulsed HF laser preionization

33. Effects of flow field uniformity on energy stability of discharge initiated repetitively pulsed HF laser

35. Purify Technology of Laser Medium in Non-chain Pulsed HF Laser

36. The development and progress of XeCl Excimer laser system

38. Development of optically pumped XeF laser technology in NINT

39. Discharge initiated high power repetitively pulsed HF/DF laser

40. Progress on high power excimer laser in NINT

42. Discharge initiated non-chain high power repetitively pulsed HF/DF laser

43. Discharge initiated non-chain high power repetitively pulsed HF/DF laser

45. Research on 3-Ray Automatic Alignment in High Power Excimer Laser MOPA System

46. Sub-ns Jitter, 1ns Risetime and 10kV Rectangular Pulse Trigger Generator

48. Discharge pumped non-chain repetitively pulsed HF laser

49. A 20 kV, 5 A, 1 ns Risetime Pulsed Electron Beam Source

50. A narrow linewidth and tunable XeF(C–A) laser

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