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1. Ultra-High-density 3D vertical RRAM with stacked JunctionLess nanowires for In-Memory-Computing applications

2. Laser Processing For 3D Junctionless Transistor Fabrication

10. A cost effective RF-SOI Drain Extended MOS transistor featuring PSAT=19dBm @28GHz & VDD=3V for 5G Power Amplifier application

13. Ultra-low power 1T-DRAM in FDSOI technology

17. 3-Tier BSI CIS with 3D Sequential & Hybrid Bonding Enabling a1.4um pitch,106dB HDR Flicker Free Pixel

18. Methodology for Active Junction Profile Extraction in thin film FD-SOI Enabling performance driver identification in 500°C devices for 3D sequential integration

20. High-resistivity silicon-based substrate using buried PN junctions towards RFSOI applications

23. 3D sequential integration: applications and associated key enabling modules (design & technology)

25. Opportunities and challenges brought by 3D-sequential integration

26. A Review of Low Temperature Process Modules Leading Up to the First (≤500 °C) Planar FDSOI CMOS Devices for 3-D Sequential Integration

27. Impact of spacer interface charges on performance and reliability of low temperature transistors for 3D sequential integration

29. Low temperature high voltage analog devices in a 3D sequential integration

30. Comparative experimental study of junctionless and inversion-mode nanowire transistors for analog applications

31. All-Operation-Regime Characterization and Modeling of Drain Current Variability in Junctionless and Inversion-Mode FDSOI Transistors

32. 28nm FDSOI CMOS Technology (FEOL and BEOL) Thermal Stability for 3D Sequential Integration: Yield and Reliability Analysis

33. First Demonstration of Low Temperature (≤500°C) CMOS Devices Featuring Functional RO and SRAM Bitcells toward 3D VLSI Integration

34. RF Performance of a Fully Integrated 3D Sequential Technology

36. Laser Processing For 3D Junctionless Transistor Fabrication

37. Bottom Tier High Voltage Vevice Thermal Stability in 3D Sequential Integration for More than Moore Applications

40. Novel Fine-Grain Back-Bias Assist Techniques for 14nm FDSOI Top-Tier SRAMs integrated in 3D-Monolithic

41. Back-bias impact on variability and BTI for 3D-monolithic 14nm FDSOI SRAMs applications

43. Tunability of Parasitic Channel in Gate-All-Around Stacked Nanosheets

44. Z²-FET DC hysteresis: deep understanding and preliminary model

45. A review of the Z 2 -FET 1T-DRAM memory: Operation mechanisms and key parameters

47. Performance and design considerations for gate-all-around stacked-NanoWires FETs

48. Design technology co-optimization of 3D-monolithic standard cells and SRAM exploiting dynamic back-bias for ultra-low-voltage operation

49. High performance low temperature FinFET with DSPER, gate last and Self Aligned Contact for 3D sequential mtegration

50. Towards 500°C SPER activated devices for 3D sequential integration

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