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15 results on '"Kubenz, M."'

5. Fabrication of Nanoimprint stamps for photonic crystals

Author

Mai A, Kubenz M, J. Kouba, W. Eberhardt, B. Loechel, and Ropers G

Subjects
chemistry.chemical_classification, History, Materials science, Fabrication, Silicon, business.industry, Scanning electron microscope, chemistry.chemical_element, Nanotechnology, Polymer, Computer Science Applications, Education, chemistry, Visible range, Optoelectronics, Dry etching, business, Electron-beam lithography, Photonic crystal
Abstract

We report on fabrication of nanoimprint stamps for fabrication of two dimensional photonic crystals in visible range of spectra. Nanoimprint stamps made of silicon and/or nickel were successfully fabricated using electron beam lithography and advanced dry etching techniques. The quality of the stamps was evaluated using scanning electron microscopy. The fabricated stamps were also evaluated by imprinting them into suitable polymer materials.

Published
2006

6. Nanoimprint lithography for 3D surface nanostructuring and photonic devices

Author

Reboud, V., Kehagias, N., Zelsmann, M., Lovera, P., Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., Redmond, G., Sotomayor Torres, C.M, Clot, Marielle, Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), and Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2007

7. 3D nanofabrication by reverse contact UV nanoimprint lithography

Author

Kehagias, N., Reboud, V., Chansin, G., Zelsmann, M., Jeppesen, C., Schuster, C., Kubenz, M., Reuther, F., Gruetzner, C.M., Sotomayor Torres, C.M, Laboratoire des technologies de la microélectronique (LTM), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2007

8. Embedded nano channels fabricated by reverse contact UV nanoimprint lithography

Author

Kehagias, N., Reboud, V., Chansin, G., Zelsmann, M., Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., Sotomayor, C.M., Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Clot, Marielle, and Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2007

9. Nanoimprint lithography for three-dimensional nanopatterning

Author

Kehagias, N., Reboud, V., Chansin, G., Zelsmann, M., Jeppesen, C., Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., Sotomayor Torres, C.M, Clot, Marielle, Laboratoire des technologies de la microélectronique (LTM), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2007

10. Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

Author

Kehagias, N., Chansin, G., Reboud, V., Kehoe, T., Zelsmann, M., Schuster, C., Kubenz, M., Fink, M., Reuther, F., Gruetzner, G., Sotomayor, C.M., Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Clot, Marielle, and Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2006

11. Reverse UV nanoimprint lithography technique for 3D nanofabrication

Author

Kehagias, N., Chansin, G., Reboud, V., Zelsmann, M., Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., Sotomayor, C.M., Laboratoire des technologies de la microélectronique (LTM), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Clot, Marielle, and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)

Subjects
ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2006

12. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

Author

Kehagias, N., Reboud, V., Chansin, G., Zelsmann, M., Jeppesen, Claus, Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., Torres, C.M.S., Kehagias, N., Reboud, V., Chansin, G., Zelsmann, M., Jeppesen, Claus, Schuster, C., Kubenz, M., Reuther, F., Gruetzner, G., and Torres, C.M.S.

Abstract

In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional patterning. Three-dimensional woodpile-like structures were successfully fabricated with this new technique.

Published
2007

15. Design of low T g thermosets for short cycle time nanoimprint lithography

Author

Reuther, F., Fink, M., Kubenz, M., Schuster, C., Vogler, M., and Gruetzner, G.

Subjects
*POLYMERS, *LITHOGRAPHY, *GLASS transition temperature, *POLYMERIZATION
Abstract

Abstract: The benefits of allyl prepolymers for nanoimprint lithography (NIL) are investigated. Allyl prepolymers cure during the imprint process as a result of heating. They have the potential to enable NIL at lower temperatures, while the imprinted patterns show high thermal stability in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is strictly determined by the glass transition temperature (T g) of the polymer. Allyl prepolymers reported here are modified with the aim of obtaining high quality imprints at decreased imprint temperature and reduced cycle time of the imprint process. Free-radical initiators are applied to increase the polymerization rate and to let the polymerization start at lower temperatures. Adding plasticizers results in a decrease in T g. Most favourable systems are selected out of a variety of various mixtures for imprint tests. [Copyright &y& Elsevier]

Published
2005
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