10 results on '"Krisa, William L."'
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2. 0.35-um i-line poly processing with a bottom antireflective coating (BARC)
3. Contact performance with an attenuated phase shift reticle and variable partial coherence
4. Process optimization for 0.35-um i-line lithography
5. I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles
6. Investigating positive DUV resist profile on TiN.
7. 0.25-m multilevel interconnect with DUV processing.
8. Contact performance with an attenuated phase shift reticle and variable partial coherence.
9. 0.35-um i-line poly processing with a bottom antireflective coating (BARC).
10. Process optimization for 0.35-um i-line lithography.
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