Back to Search Start Over

Process optimization for 0.35-um i-line lithography.

Authors :
Garza Sr., Cesar M.
Krisa, William L.
Yen, Anthony
Shu, Jing S.
Source :
Proceedings of SPIE; 11/ 1/1994, Issue 1, p636-647, 12p
Publication Year :
1994

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65853624
Full Text :
https://doi.org/10.1117/12.175458