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We report electron-beam activated motion of a catalytic nanoparticle along a graphene step edge and associated etching of the edge. This approach enables beam-controlled etching of matter through activated electrocatalytic processes. The applications of electron-beam control as a paradigm for molecular-scale robotics are discussed.

The burgeoning field of atomic level material control holds great promise for future breakthroughs in quantum and memristive device manufacture and fundamental studies of atomic-scale chemistry. Realization of atom-by atom control of matter represents a complex and ongoing challenge. Here, we explore the feasibility of controllable motion of dopant Si atoms at the edges of graphene via the sub-atomically focused electron beam in a scanning transmission electron microscope (STEM). We demonstrate that the graphene edges can be cleaned of Si atoms and then subsequently replenished from nearby source material. It is also shown how Si edge atoms may be pushed from the edge of a small hole into the bulk of the graphene lattice and from the bulk of the lattice back to the edge. This is accomplished through sputtering of the edge of the graphene lattice to bury or uncover Si dopant atoms. These experiments form an initial step toward general atomic scale material control.

We demonstrate assembly of di-, tri- and tetrameric Si clusters on the graphene surface using sub-atomically focused electron beam of a scanning transmission electron microscope. Here, an electron beam is used to introduce Si substitutional defects and defect clusters in graphene with spatial control of a few nanometers, and enable controlled motion of Si atoms. The Si substitutional defects are then further manipulated to form dimers, trimers and more complex structures. The dynamics of a beam induced atomic scale chemical process is captured in a time-series of images at atomic resolution. These studies suggest that control of the e-beam induced local processes offers the next step toward atom-by-atom nanofabrication and provides an enabling tool for study of atomic scale chemistry in 2D materials.

CVD grown graphene used in (scanning) transmission electron microscopy ((S)TEM) studies must undergo a careful transfer of the one-atom-thick membrane from the growth surface (typically a Cu foil) to the TEM grid. During this transfer process, the graphene invariably becomes contaminated with foreign material. This contamination proves to be very problematic in the (S)TEM because often >95% of the graphene is obscured and imaging of the pristine areas results in e-beam-induced hydrocarbon deposition which further acts to obscure the desired imaging area. In this article, we examine two cleaning techniques for CVD grown graphene that mitigate both aspects of the contamination problem: visible contamination covering the graphene, and invisible contamination that deposits onto the graphene under e-beam irradiation. The visible contamination may be removed quickly by a rapid thermal annealing to 1200 C in situ and the invisible e-beam-deposited contamination may be removed through an Ar/O2 annealing procedure prior to imaging in the (S)TEM.

We demonstrate that the sub-atomically focused beam of a scanning transmission electron microscope (STEM) can be used to controllably manipulate individual dopant atoms in a 2D graphene lattice. We demonstrate the manipulation of adsorbed source materials and the graphene lattice with the electron beam such that individual vacancy defects can be controllably passivated by Si substitutional atoms. We further demonstrate that these Si defects may be directed through the lattice via e-beam control or modified (as yet, uncontrollably) to form new defects which can incorporate new atoms into the graphene lattice. These studies demonstrate the potential of STEM for atom-by-atom nanofabrication and fundamental studies of chemical reactions in 2D materials on the atomic level.

The ability to engineer the thermal conductivity of materials allows us to control the flow of heat and derive novel functionalities such as thermal rectification, thermal switching, and thermal cloaking. While this could be achieved by making use of composites and metamaterials at bulk scales, engineering the thermal conductivity at micro- and nano-scale dimensions is considerably more challenging. In this work we show that the local thermal conductivity along a single Si nanowire can be tuned to a desired value (between crystalline and amorphous limits) with high spatial resolution through selective helium ion irradiation with a well-controlled dose. The underlying mechanism is understood through molecular dynamics simulations and quantitative phonon-defect scattering rate analysis, where the behavior of thermal conductivity with dose is attributed to the accumulation and agglomeration of scattering centers at lower doses. Beyond a threshold dose, a crystalline-amorphous transition was observed.