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Neuromorphic computing has recently emerged as a potential alternative to the conventional von Neumann computer paradigm, which is inherently limited due to its architectural bottleneck. Thus, new artificial components and architectures for brain-inspired computing hardware implementation are required. Bipolar analog memristive devices, whose resistance (or conductance) can be continuously tuned (as a synaptic weight), are potential candidates for artificial synapse applications. In this work, lanthanum nickelate (La2NiO4+ δ , L2NO4), a mixed ionic electronic conducting oxide, is used in combination with TiN and Pt electrodes. The TiN/L2NO4/Pt devices show bipolar resistive switching with gradual transitions both for the SET and RESET processes. The resistance (conductance) can be gradually modulated by the pulse amplitude and duration, showing good data retention characteristics. A linear relationship between the resistance change and total applied pulse duration is experimentally measured. Moreover, synaptic depression and potentiation characteristics, one of the important functions of bio-synapses, are artificially reproduced for these devices, then modeled and successfully tested in a spiking neural network environment. These results indicate the suitability of using TiN/L2NO4/Pt memristive devices as long-term artificial synapses in neuromorphic computing. [ABSTRACT FROM AUTHOR]

Metal oxide-based resistive random access memory devices are highly attractive candidates for next-generation nonvolatile memories, but the resistive switching phenomena remain poorly understood. This article focuses on the microscopic understanding of the initial forming step, which is decisive for the switching process. The integrated resistive switching memory effect in Ti / Hf O 2 / TiWN metal insulator metal structures is studied. After forming, transmission electron microscopy investigations pointed out the presence of a funnel-shaped region, in the ON state of the cell, where slightly oxidized Ti (Ti Ox ) was present within Hf O 2 dielectric. Modeling of the measured ON state conductance of the cell with the semi-classical approximation is consistent with a conductive nanometric Ti Ox filament (or a sum of sub-nanometric Ti Ox filaments) present in the funnel-shaped region. The conductive area is likely formed by diffusion after the dielectric breakdown. [ABSTRACT FROM AUTHOR]

Valence change memories, in which internal redox reactions control the change in resistance are promising candidates for resistive random access memories (ReRAMs) and neuromorphic computing elements. In this context, La2NiO4+δ (L2NO4), a mixed ionic‐electronic conducting oxide, well known for its highly mobile oxygen interstitial ions, emerges as a potential switching material for novel L2NO4‐based memristive devices. However, their integration in complementary metal oxide semiconductor (CMOS) technology still has to be demonstrated, as the major focus of previous studies has been carried out on epitaxial films grown on single crystals. In this work, the optimization of the deposition temperature and precursor solution composition is presented, allowing to obtain high‐quality polycrystalline L2NO4 thin films grown by metal organic chemical vapor deposition on a platinized silicon substrate, and to use these films to build memristive devices in vertical configuration with Ti top electrodes. A bipolar analog‐type transition in resistance can be achieved in Ti/L2NO4/Pt memristive devices. While the "forming" process required for the devices based on nonoptimized L2NO4 thin films is considered as a drawback, the Ti/optimized L2NO4/Pt devices are forming‐free and exhibit a good cyclability. These results prove the switching response of L2NO4‐based devices in a vertical configuration for the first time. [ABSTRACT FROM AUTHOR]

Results are reported involving hexagonal-shaped microlasers derived from two-dimensional photonic crystals (PC), using InP-based materials on SiO[subscript 2]/Si wafers.

In this paper, an extensive investigation of hybrid molecular/Si field-effect memories is presented, where redox ferrocene (Fc) molecules play the role of the memory charge storage nodes. Engineering of the organic linkers between Fc and Si is achieved by grafting Fc with different linker lengths. The study shows a clear correlation between results from atomistic computational density functional theory, electrochemical measurements (cyclic voltammetry) and electrical data obtained by a detailed study on capacitors and pseudo-MOS devices. Physical–chemical analyses (atomic force microscopy, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy), corroborate the quality of molecular layers on devices. [ABSTRACT FROM PUBLISHER]