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The effect of the Ti getter layer and annealing on HfO2-based resistive random access memory studied by X-ray absorption, X-ray diffraction and electrical measurements
- Source :
- E-MRS Spring Meeting, Symp. M, E-MRS Spring Meeting, Symp. M, May 2015, Lille, France
- Publication Year :
- 2015
- Publisher :
- HAL CCSD, 2015.
-
Abstract
- International audience
- Subjects :
- [CHIM.MATE]Chemical Sciences/Material chemistry
ComputingMilieux_MISCELLANEOUS
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- E-MRS Spring Meeting, Symp. M, E-MRS Spring Meeting, Symp. M, May 2015, Lille, France
- Accession number :
- edsair.dedup.wf.001..14debd9a7edd47a201c63277fc8447b8