1. Solid-state dewetting of single-crystal silicon on insulator: effect of annealing temperature and patch size
- Author
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Rainer Backofen, Abdelmalek Benkouider, Isabelle Berbezier, Axel Voigt, Marco Abbarchi, Mohammed Bouabdellaoui, Luc Favre, David Grosso, Marco Salvalaglio, Mario Lodari, Antoine Ronda, Thomas David, Thomas Bottein, Monica Bollani, Meher Naffouti, Ibtissem Fraj, Jean-Benoît Claude, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire de Micro-optoélectronique et Nanostructures, Faculté des Sciences de Monastir, CNR Istituto di Fotonica e Nanotecnologie [Padova] ( IFN ), Consiglio Nazionale delle Ricerche [Roma] ( CNR ), Institute of Scientific Computing, Department of Mathematics, Technische Universität Dresden ( TUD ), IFN-CNR and Dipartimento di Fisica, Politecnico di Milano [Milan], Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Laboratoire de Micro-optoélectronique et Nanostructures [Monastir], Faculté des Sciences de Monastir (FSM), Université de Monastir - University of Monastir (UM)-Université de Monastir - University of Monastir (UM), CNR Istituto di Fotonica e Nanotecnologie [Padova] (IFN), Consiglio Nazionale delle Ricerche [Roma] (CNR), Technische Universität Dresden = Dresden University of Technology (TU Dresden), Dipartimento di Fisica [Politecnico Milano], Politecnico di Milano [Milan] (POLIMI), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), and Dipartimento di Fisica [Politecnico Milano] (POLIMI)
- Subjects
Materials science ,Annealing (metallurgy) ,Solid-state ,Insulator (electricity) ,02 engineering and technology ,01 natural sciences ,Instability ,Square (algebra) ,Monocrystalline silicon ,0103 physical sciences ,Single crystal silicon ,Dewetting ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,Nano-patterning ,Electrical and Electronic Engineering ,010306 general physics ,Condensed matter physics ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Ultra-thin silicon on insulator ,0210 nano-technology ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] ,Solid-state dewetting - Abstract
We address the solid state dewetting of ultra-thin and ultra-large patches of monocrystalline silicon on insulator. We show that the underlying instability of the thin Si film under annealing can be perfectly controlled to form monocrystalline, complex nanoarchitectures extending over several microns. These complex patterns are obtained guiding the dewetting fronts by etching ad-hoc patches prior to annealing. They can be reproduced over hundreds of repetitions extending over hundreds of microns. We discuss the effect of annealing temperature and patch size on the stability of the final result of dewetting showing that for simple patches (e.g. simple squares) the final outcome is stable and well reproducible at 720 degrees C and for similar to 1 mu m square size. Finally, we demonstrate that introducing additional features within squared patches (e.g. a hole within a square) stabilises the dewetting dynamic providing perfectly reproducible complex nanoarchitectures of 5 pm size. (C) 2018 Elsevier B.V. All rights reserved.
- Published
- 2018