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150 results on '"Gui, Chengqun"'

13. Nondestructive Demolding of Structure-Designable High-Aspect-Ratio Nanoimprint Template

Author

Chen, Shuo, Shu, Yu, Cao, Hao, Wang, Deming, Wan, Hui, and Gui, Chengqun

Abstract

Demolding is a crucial step in nanoimprint lithography (NIL) for successfully transferring template structures onto resist materials. The process, however, is often hindered by the adhesion and friction between the template and resist, leading to inevitable defects on the replicas and posing challenges in replicating templates with high-aspect-ratio (HAR) structures. Here, we introduce a novel approach using the dissolvable template method to achieve the nondestructive demolding of structure-designable HAR nanoimprint templates. The templates were fabricated by the 3D lithography technology, employing a positive photoresist that can be easily dissolved in alkaline solutions after exposure to ultraviolet (UV) radiation. By implementing this method, we successfully transferred dense arrays of pillars with a minimal diameter of 1.2 μm and a significant aspect ratio of 18, as well as a microlens array diffuser with randomly distributed structural parameters. The dissolvable template method paves the way for stress-free demolding, broadening NIL’s application range.

Published
2024
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14. Micromirror Array with Adjustable Reflection Characteristics Based on Different Microstructures and Its Application.

Author

Cao, Hao, Xue, Zhishuang, Deng, Hongfeng, Chen, Shuo, Wang, Deming, and Gui, Chengqun

Subjects
MIRRORS, LUMINANCE (Photometry), COMPUTER performance, MICROSTRUCTURE
Abstract

The conventional reflective optical surface with adjustable reflection characteristics requires a complex external power source. The complicated structure and preparation process of the power system leads to the limited modulation of the reflective properties and difficulty of use in large-scale applications. Inspired by the biological compound eye, different microstructures are utilized to modulate the optical performance. Convex aspheric micromirror arrays (MMAs) can increase the luminance gain while expanding the field of view, with a luminance gain wide angle > 90° and a field-of-view wide angle close to 180°, which has the reflective characteristics of a large gain wide angle and a large field-of-view wide angle. Concave aspheric micromirror arrays can increase the luminance gain by a relatively large amount of up to 2.66, which has the reflective characteristics of high gain. Industrial-level production and practical applications in the projection display segment were carried out. The results confirmed that convex MMAs are able to realize luminance gain over a wide spectrum and a wide range of angles, and concave MMAs are able to substantially enhance luminance gain, which may provide new opportunities in developing advanced reflective optical surfaces. [ABSTRACT FROM AUTHOR]

Published
2024
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35. Mechanical System and Dynamic Control in Photolithography for Nanoscale Fabrication: A Critical Review

Author

Song, Yi, Gui, Chengqun, Huo, Zongliang, Lee, Ricky Shi-wei, Liu, Sheng, Song, Yi, Gui, Chengqun, Huo, Zongliang, Lee, Ricky Shi-wei, and Liu, Sheng

Abstract

As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer-scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.

Published
2021

46. A high-Tc superconductor bolometer on a silicon nitride membrane

Author

Sanchez, Stefan, Elwenspoek, Miko, Gui, Chengqun, Nivelle, J.M.E. de, Vries, Robert de, Korte, Piet A.J. de, Bruijn, Marcel P., Wijnberger, Jan J., Michalke, Wolfgang, Steinbeiss, Erwin, Heidenblut, Torsten, and Schwierzi, Bernhard

Subjects
Semiconductor nuclear counters -- Innovations, Miniature electronic equipment -- Design and construction, Infrared detectors -- Innovations, Nanotechnology -- Innovations, Engineering and manufacturing industries, Science and technology
Published
1998

47. Nonlinearity and hysteresis of resonant strain gauges

Author

Gui, Chengqun, Legtenberg, Rob, Tilmans, Harri A.C., Fluitman, Jan H.J., and Elwenspoek, Miko

Subjects
Strain gages -- Evaluation, Miniature electronic equipment -- Evaluation, Hysteresis -- Measurement, Engineering and manufacturing industries, Science and technology
Published
1998

48. Investigation of Flexible Nanoporous Silver Materials Fabricated by Femtosecond Laser

Author

赵强 Zhao Qiang, 桂成群 Gui Chengqun, 周圣军 Zhou Shengjun, 栾世奕 Luan Shiyi, 于圣韬 Yu Shengtao, and 万辉 Wan Hui

Subjects
Materials science, law, business.industry, Nanoporous, Femtosecond, Optoelectronics, Electrical and Electronic Engineering, Laser, business, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention
Published
2021
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