111 results on '"Gharbi, Ahmed"'
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2. Morphology modifcation of Si nanopillars under ion irradiation at elevated temperatures: plastic deformation and controlled thinning to 10 nm
3. Silicon nitride photonics: large scale integration and applications
4. Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering
5. Biochemical parameters and oxidative stress markers in Tunisian patients with periodontal disease
6. Al2O3 Dot and Antidot Array Synthesis in Hexagonally Packed Poly(styrene-block-methyl methacrylate) Nanometer-Thick Films for Nanostructure Fabrication
7. Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration
8. Intra-articular leiomyoma of the knee mimicking a ganglion cyst in a child: A case report and review of literature
9. Al2O3 Dot and Antidot Array Synthesis in Hexagonally Packed Poly(styrene-block-methyl methacrylate) Nanometer-Thick Films for Nanostructure Fabrication.
10. Exploring strategies to contact 3D nano-pillars
11. Primary sclerosing epithelioid fibrosarcoma presenting as lombosciatic syndrome: Case report and literature review
12. Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning
13. Hybrid E-beam lithography and process improvement for nanodevice fabrication
14. Morphology of poly(lactide)‐ block ‐poly(dimethylsiloxane)‐ block ‐polylactide high‐ χ triblock copolymer film studied by grazing incidence small‐angle X‐ray scattering
15. Exploring Strategies to Contact 3D Nano-Pillars
16. Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography
17. GIANT CONDYLOMA ACUMINATUM IN AN INFANT
18. Morphology modification of Si nanopillars under ion irradiation at elevated temperatures: plastic deformation and controlled thinning to 10 nm
19. Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
20. X-ray characterization of contact holes for block copolymer lithography
21. Block copolymer selectivity: A new dry etch approach for cylindrical applications
22. Characterizing the internal structure of BCP filled contact holes with critical dimension small angle x-ray scattering (Conference Presentation)
23. DSA process characterization using BSE metrology (Conference Presentation)
24. Inorganic guiding template implementation for DSA contact hole shrink process (Conference Presentation)
25. Pillars fabrication by DSA lithography: material and process options
26. An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly
27. p-type silicon doping profiling using electrochemical anodization.
28. Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach
29. A track process for solvent annealing of high-χ BCPs
30. Advanced surface affinity control for DSA contact hole shrink applications
31. Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning
32. Hybrid E-beam lithography and process improvement for nanodevice fabrication
33. Morphology of poly(lactide)‐block‐poly(dimethylsiloxane)‐block‐polylactide high‐χtriblock copolymer film studied by grazing incidence small‐angle X‐ray scattering
34. Process highlights to enhance directed self-assembly contact patterning performances
35. PMMA removal selectivity to polystyrene using dry etch approach
36. Placement error in directed self-assembly of block copolymers for contact hole application
37. Investigation of coat-develop track system for placement error of contact hole shrink process
38. PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication
39. Contact holes patterning by directed self-assembly of block copolymers: process window study
40. PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications
41. Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances
42. Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy
43. Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
44. Improvements of self-assembly properties via homopolymer addition or block-copolymer blends
45. Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
46. Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration.
47. High-density oxidized porous silicon
48. Advanced surface affinity control for DSA contact hole shrink applications
49. A track process for solvent annealing of high-χBCPs
50. Investigation of current-voltage characteristics of p-type silicon during electrochemical anodization and application to doping profiling
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