19 results on '"G. Chaumont"'
Search Results
2. The RHRPMICL1A Integrated Current Limiter: Radiation Tests and High Voltage Application
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Ignazio Bruno Mirabella, G. Chaumont, and Salvatore Pappalardo
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Busbar ,Computer science ,Phase (waves) ,High voltage ,Integrated circuit ,law.invention ,Reliability (semiconductor) ,Current limiting ,law ,visual_art ,Electronic component ,visual_art.visual_art_medium ,Electronic engineering ,Voltage - Abstract
This paper provides a detailed overview of the reliability and radiation tests (both TID and SEE) performed inside the QML-V qualification phase and a high voltage application of RHRPMICL1A IC (integrated circuit) device, a rad-hard integrated current limiter designed and developed by STMicroelectronics. The device was born from the idea of ESA to have an ICL (Integrated Current Limiter) of universal use and containing most of the components for the relevant current limiter functions (such as the Latching and Re-triggerable modes), in order to avoid recurrent re-design and implementation by using discrete components. The device has obtained recently the QML-V qualification with SMD number 5962–17211. The high voltage application, described in the second part of this paper, allows using the device in power bus of 100V or higher, as those ones required more and more in the telecom satellites. The related application tests, performed in the laboratory for the validation of the proposed solution, are also presented.
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- 2019
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3. TID and SEE Responses of Rad-Hard A/D Converter RHFAD128
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O. Croisat, Christophe Prugne, A. Souflet, G. Chaumont, and F. Malou
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Physics ,Absorbed dose ,020208 electrical & electronic engineering ,Radiochemistry ,0202 electrical engineering, electronic engineering, information engineering ,020206 networking & telecommunications ,02 engineering and technology ,Heavy ion irradiation ,A d converter - Abstract
This paper reports on the different responses observed during heavy ion irradiation and Total Ionizing dose test on a newly developed Rad-Hard, 8-Channel, 50ksps to 1Msps, 12-Bit A/D Converter, called RHFAD128.
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- 2019
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4. Post-Irradiation-Gate-Stress on Power MOSFETs: Quantification of Latent Defects-Induced Reliability Degradation
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J.-R. Vaille, Andre Touboul, Frédéric Saigné, S. Bourdarie, A. Privat, G. Chaumont, A. Michez, Richard Arinero, Frédéric Wrobel, N. Chatry, Eric Lorfevre, Service Geologique de la Nouvelle-Calédonie, Direction de l'Industrie, des Mines et de l'Energie, Institut d’Electronique et des Systèmes (IES), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Radiations et composants (RADIAC), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), ONERA - The French Aerospace Lab [Toulouse], ONERA, TRAD [Labège], TRAD, STMicroelectronics, and Centre National d'Études Spatiales [Toulouse] (CNES)
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010302 applied physics ,Nuclear and High Energy Physics ,Materials science ,010308 nuclear & particles physics ,business.industry ,01 natural sciences ,Heavy ion irradiation ,[SPI.TRON]Engineering Sciences [physics]/Electronics ,Stress (mechanics) ,Reliability (semiconductor) ,Nuclear Energy and Engineering ,13. Climate action ,0103 physical sciences ,Electronic engineering ,Optoelectronics ,Degradation (geology) ,Heavy ion ,Irradiation ,Electrical and Electronic Engineering ,Power MOSFET ,business ,ComputingMilieux_MISCELLANEOUS - Abstract
Electrical characterizations are used to understand power MOSFETs failure mechanisms after heavy ion irradiation. Results indicate that both bias levels and impact localization of heavy ion are important parameters for SEGR triggering or latent defect formation. This work addresses the limits of the post-irradiation gate stress relevance used for Power MOSFETs space qualification.
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- 2013
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5. Assembly Mechanism of Zr-Containing and Other TM-Containing Polyoxometalates
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Química Quàntica, Química Física i Inorgànica, Universitat Rovira i Virgili, Poblet, J. M. ; Jimenez-Lozano, P. ; Solé-Daura, A. ; Wipff, G. ; Chaumont, A. ; Carbó, J., Química Quàntica, Química Física i Inorgànica, Universitat Rovira i Virgili, and Poblet, J. M. ; Jimenez-Lozano, P. ; Solé-Daura, A. ; Wipff, G. ; Chaumont, A. ; Carbó, J.
- Abstract
Filiació URV: SI, The mechanism by which Zr-substituted and other transition metal-substituted polyoxometalates form covalently linked dimers has been analyzed by means of static density functional theory and Car¿Parrinello molecular dynamics simulations. The study identifies the Zr-aqua-hydro anion, [W5O18Zr(OH)(H2O)]3¿, as the active species under basic conditions. For [W5O18TM(H2O)m(OH)]n¿ anions, the energy barrier is low for ZrIV as a consequence of the flexible coordination environment, moderate for TiIV, and high for WVI.
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- 2017
6. Statistical Analysis of Heavy-Ion Induced Gate Rupture in Power MOSFETs—Methodology for Radiation Hardness Assurance
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Michele Muschitiello, B. Eisener, N. Ikeda, Veronique Ferlet-Cavrois, S. Gamerith, Francesco Pintacuda, C. Binois, Ali Mohammadzadeh, M. Inoue, Marty R. Shaneyfelt, J.R. Schwank, Christian Poivey, Arto Javanainen, A. Carvalho, Raymond L. Ladbury, G. Chaumont, and J-M Lauenstein
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Nuclear and High Energy Physics ,Space technology ,Materials science ,ta114 ,Dielectric strength ,business.industry ,Electrical engineering ,Failure rate ,Hardware_PERFORMANCEANDRELIABILITY ,law.invention ,Capacitor ,Nuclear Energy and Engineering ,law ,Gate oxide ,MOSFET ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,Electrical and Electronic Engineering ,Power MOSFET ,business ,Radiation hardening ,Hardware_LOGICDESIGN - Abstract
A methodology for power MOSFET radiation hardness assurance is proposed. It is based on the statistical analysis of destructive events, such as gate oxide rupture. Examples of failure rate calculations are performed.
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- 2012
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7. Effect of Ion Energy on Power MOSFET's Oxide Reliability
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Antoine Touboul, G. Chaumont, Frédéric Saigné, Eric Lorfevre, Jean-Roch Vaillé, M. Naceur, Francoise Bezerra, Institut d’Electronique et des Systèmes (IES), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Radiations et composants (RADIAC), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Centre National d'Études Spatiales [Toulouse] (CNES), and STMicroelectronics
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010302 applied physics ,Nuclear and High Energy Physics ,Materials science ,010308 nuclear & particles physics ,business.industry ,Ion track ,Electrical engineering ,Oxide ,01 natural sciences ,Die (integrated circuit) ,[SPI.TRON]Engineering Sciences [physics]/Electronics ,chemistry.chemical_compound ,Reliability (semiconductor) ,Nuclear Energy and Engineering ,chemistry ,13. Climate action ,0103 physical sciences ,Stopping power (particle radiation) ,Degradation (geology) ,Optoelectronics ,Irradiation ,Electrical and Electronic Engineering ,Power MOSFET ,business ,ComputingMilieux_MISCELLANEOUS - Abstract
Heavy ion-induced Power MOSFET's reliability degradation has been studied. Irradiations were realized at low and high energy with the same electronic stopping power at the surface of the die. For both energies, a decrease of the charge to breakdown has been observed after irradiation. However, an enhanced degradation of the oxide layer reliability is observed at low energy. The lifetime reduction at high energy is correlated to local disorder along the ion track that can act as precursor damage. On the other hand, the most important reliability degradation at low energy is attributed to a synergy effect between ionizing and non-ionizing processes. Clusters of defects can indeed be formed, adding an additional wear-out mechanism. These results may be significant in the frame of Single Event Testing
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- 2012
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8. Enhanced Low Dose Rate Sensitivity at Ultra-Low Dose Rates
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Rafi Albarian, S.R. Cox, Bruce Holcombe, S. P. Buchner, R.L. Pease, Kirby Kruckmeyer, Sam Burns, G. Chaumont, A. Ouellet, James Fred Salzman, J.D. Forney, Bradley A. Little, M.A. Carts, H. Duperray, Dakai Chen, Ken LaBel, and A. Phan
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Nuclear and High Energy Physics ,Materials science ,Ultra low dose ,business.industry ,Radiochemistry ,Electrical engineering ,Radiation ,Nuclear Energy and Engineering ,Enhanced degradation ,Low dose rate ,Irradiation ,Electrical and Electronic Engineering ,Dose rate ,business ,Radiation hardening ,Sensitivity (electronics) - Abstract
We present results on the effects of ELDRS at dose rates of 10, 5, 1, and 0.5 mrad(Si)/s for a variety of commercial, radiation hardened, and ELDRS-free devices. We observed low dose rate enhancement below 10 mrad(Si)/s in several different part types. The magnitudes of the low dose rate enhancement varied substantially. The most notable case showed dose rate sensitivity in the functional failures for a commercial voltage regulator, with initial failures occurring after 10 krad(Si) for the parts irradiated at 0.5 mrad(Si)/s. Radiation hardened and ELDRS-free devices also showed ELDRS at the ultra-low dose rates. An ELDRS-free high power regulator showed a low dose rate enhancement factor of ×33 after 10 krad(Si) for parts irradiated at 0.5 mrad(Si)/s. The enhanced degradation at the ultra-low dose rates present challenges for hardness assurance.
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- 2011
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9. Impact of Single Event Gate Rupture and Latent Defects on Power MOSFETs Switching Operation
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Antoine Touboul, A. Privat, Francois Forest, Eric Lorfevre, Richard Arinero, Frédéric Wrobel, Jean-Jacques Huselstein, Frédéric Saigné, N. Chatry, Mickael Petit, G. Chaumont, J.-R. Vaille, S. Bourdarie, Institut d’Electronique et des Systèmes (IES), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Radiations et composants (RADIAC), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de Métrologie et de Dosimétrie des Neutrons (LMDN), Institut de Radioprotection et de Sûreté Nucléaire (IRSN), Groupe énergie et matériaux (GEM), Institut de recherche en astrophysique et planétologie (IRAP), Institut national des sciences de l'Univers (INSU - CNRS)-Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Observatoire Midi-Pyrénées (OMP), Météo France-Centre National d'Études Spatiales [Toulouse] (CNES)-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Météo France-Centre National d'Études Spatiales [Toulouse] (CNES)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Centre National de la Recherche Scientifique (CNRS), Université de Nîmes (UNIMES), ONERA - The French Aerospace Lab [Toulouse], ONERA, Composants à Nanostructure pour le moyen infrarouge (NANOMIR), TRAD [Labège], TRAD, STMicroelectronics, and Centre National d'Études Spatiales [Toulouse] (CNES)
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Nuclear and High Energy Physics ,Materials science ,business.industry ,Electrical engineering ,[SPI.TRON]Engineering Sciences [physics]/Electronics ,Stress (mechanics) ,Nuclear Energy and Engineering ,Hardware_INTEGRATEDCIRCUITS ,Gate driver ,Enhanced degradation ,Energy transformation ,Power semiconductor device ,Electrical and Electronic Engineering ,Power MOSFET ,business ,Sensitivity (electronics) ,Event (particle physics) ,ComputingMilieux_MISCELLANEOUS - Abstract
This paper reports on the impact of single event gate rupture and post-irradiation gate stress on Power MOSFETs switching ability. A dedicated setup has been developed and presented in this paper. The data showed that devices can switch after Single Event Gate Rupture. Failure of energy conversion system does not depend on gate current of the device but its associated external circuitry. Moreover, the data showed that devices having a gate layout constituted of parallel stripes are less sensitive than hexagonal shape when electrical constraints are applied after failure. It was also observed that the sensitivity of SEGR can be enhanced by X-ray irradiation but enhanced degradation is not observed during the switching operation.
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- 2014
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10. On the Use of Post-Irradiation-Gate-Stress Results to Refine Sensitive operating area determination
- Author
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Frédéric Saigné, Antoine Touboul, Eric Lorfevre, A. Privat, Francoise Bezerra, G. Chaumont, A. Michez, N. Chatry, Frédéric Wrobel, J.-R. Vaillé, S. Bourdarie, Institut d’Electronique et des Systèmes (IES), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Radiations et composants (RADIAC), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), ONERA - The French Aerospace Lab [Toulouse], ONERA, TRAD [Labège], TRAD, STMicroelectronics, Centre National d'Études Spatiales [Toulouse] (CNES), Université de Nîmes (UNIMES), and Eric, Dauverchain
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Nuclear and High Energy Physics ,Materials science ,Nuclear engineering ,Heavy ion irradiation ,[SPI.TRON] Engineering Sciences [physics]/Electronics ,[SPI.TRON]Engineering Sciences [physics]/Electronics ,Stress (mechanics) ,Reliability (semiconductor) ,Nuclear Energy and Engineering ,Stress test ,Electronic engineering ,Heavy ion ,Irradiation ,Electrical and Electronic Engineering ,Power MOSFET ,Gate current ,ComputingMilieux_MISCELLANEOUS - Abstract
This paper reports on the different responses observed during heavy ion irradiation and the Post-irradiation-Gate-Stress test on radiation-hardened Power MOSFETs. The data show a correlation between IG gate current during irradiation and different behaviors observed during the post-irradiation test. This work addresses the relevance of the post-gate stress test used in space qualification of power MOSFETs.
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- 2014
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11. Extended Temperature (−40/+90°C) Ultra Low Power Consumption with High Average Output Power (>+3 dBm) 1.55μm TOSA Module for up to 11.3 Gb/s 100 km Dispersion Compensation Free Transmission Metro Applications
- Author
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J.-L. Goudard, C. Starck, D. Richard, S. Fabre, P. Pagnod-Rossiaux, G. Chaumont, Emmanuel Grard, B. Paris, J.-R. Burie, R. Fabre, K. Bougueroua, F. Laruelle, P. Wolkowicz, and V. Rodrigues
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Physics ,Electricity generation ,Transmission (telecommunications) ,Modulation ,business.industry ,dBm ,Dispersion (optics) ,Electrical engineering ,Atmospheric temperature range ,business ,Power (physics) ,Semiconductor laser theory - Abstract
We first report on a high average output power (>3dBm) 1.55μm EML TOSA able to address industrial environment temperature range [−40/+90°C] with Ultra-Low Power consumption (0.8W) and power penalty
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- 2012
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12. Synergy of non-ionizing and ionizing processes in the reliability degradation of Power MOSFETs oxide
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Eric Lorfevre, Antoine Touboul, G. Chaumont, M. Gedion, Frédéric Wrobel, Jean-Roch Vaillé, F. Saigne, M. Naceur, and Francoise Bezerra
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Materials science ,business.industry ,Oxide ,Time-dependent gate oxide breakdown ,Non-ionizing radiation ,Ionizing radiation ,Stress (mechanics) ,chemistry.chemical_compound ,Reliability (semiconductor) ,chemistry ,Degradation (geology) ,Optoelectronics ,Power MOSFET ,business - Abstract
Charge to breakdown reduction after electric stress is observed after heavy ion irradiation at two energies exhibiting a similar LET value. An enhanced degradation of the oxide layer reliability is observed at low energy.
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- 2011
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13. Charge Collection in Power MOSFETs for SEB Characterisation—Evidence of Energy Effects
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Giovanni Santin, Ali Zadeh, C. Binois, Veronique Ferlet-Cavrois, A. Luu, M Poizat, T. Beutier, G. Chaumont, Reno Harboe-Sorensen, Christian Poivey, Daniel Peyre, Francoise Bezerra, Robert Ecoffet, Pete Truscott, J.R. Schwank, and F Sturesson
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Nuclear and High Energy Physics ,Range (particle radiation) ,Materials science ,business.industry ,Transistor ,Electrical engineering ,Die (integrated circuit) ,law.invention ,Ion ,Nuclear Energy and Engineering ,law ,Optoelectronics ,Electrical and Electronic Engineering ,Power MOSFET ,business ,Radiation hardening ,Energy (signal processing) ,Beam (structure) - Abstract
Charge collection is used as a non-destructive technique to analyze the statistical response of vertical power MOSFETs and their single-event burnout (SEB) rate as a function of the incident ion energy. Two effects are observed at either low or high energy. At low energy, the collected charge significantly decreases because of the limited ion range and energy straggling in the thick epitaxial layer. Because of this limited range effect, using low energy ions for SEB testing can significantly underestimate the SEB rate. At high energy, the presence of thick source bond wires, which partially cover the die area, as typically encountered in power MOSFETs, induce a large shadowing effect. When crossing the bond wires, high energy ions loose energy and can have a higher LET (but still a significant range) when they reach the active die. As a result, they can deposit more charge in the thick sensitive epitaxial layers of the transistors than the primary beam. A significant probability of high collected charge events is then observed at high energy. Contrary to the low energy (range) effect, the shadowing at high energy contributes to overestimating the SEB rate. General rules for the SEB radiation hardness assurance, related to the ion energy versus the power MOSFET voltage rating, are provided to avoid both range and shadowing effects.
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- 2010
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14. The Effects of ELDRS at Ultra-Low Dose Rates
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Anthony M. Phan, Bruce Holcombe, G. Chaumont, Kenneth A. LaBel, Bradley A. Little, S.R. Cox, Kirby Kruckmeyer, Al Ouellet, James Forney, Rafi Albarian, Sam Burns, Dakai Chen, Martin A. Carts, James Fred Salzman, Ronald Pease, and Herve Duperray
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Materials science ,Ultra low dose ,business.industry ,Total dose ,Electrical engineering ,Analytical chemistry ,Low dose rate ,Irradiation ,Radiation ,business ,Dose rate ,Radiation hardening ,Ionizing radiation - Abstract
We present results on the effects on ELDRS at dose rates of 10, 5, 1, and 0.5 mrad(Si)/s for a variety of radiation hardened and commercial devices. We observed low dose rate enhancement below 10 mrad(Si)/s in several different parts. The magnitudes of the dose rate effects vary. The TL750L, a commercial voltage regulator, showed dose rate dependence in the functional failures, with initial failures occurring after 10 krad(Si) for the parts irradiated at 0.5 mrad(Si)/s. The RH1021 showed an increase in low dose rate enhancement by 2X at 5 mrad(Si)/s relative to 8 mrad(Si)/s and high dose rate, and parametric failure after 100 krad(Si). Additionally the ELDRS-free devices, such as the LM158 and LM117, showed evidence of dose rate sensitivity in parametric degradations. Several other parts also displayed dose rate enhancement, with relatively lower degradations up to ~ 15 to 20 krad(Si). The magnitudes of the dose rate enhancement will likely increase in significance at higher total dose levels.
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- 2010
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15. TID and SEE Responses of Rad-Hardened A/D Converters
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Andre Uguen, G. Chaumont, Florence Malou, and Christophe Prugne
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Physics ,business.industry ,Single event upset ,Absorbed dose ,Electrical engineering ,Optoelectronics ,macromolecular substances ,Converters ,business - Abstract
We present Single Event Effects characterization and Total Ionizing Dose behaviour up to 300 krad(Si) on Rad-Hardened A/D converter.
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- 2010
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16. Characterization of new radiation hardened bipolar operational amplifiers
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G. Chaumont, Patrick Briand, Florence Malou, Christophe Prugne, and Benoit Cornanguer
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Materials science ,business.industry ,Bandwidth (signal processing) ,Facsimile ,Electrical engineering ,Radiation ,law.invention ,law ,Negative feedback amplifier ,Operational amplifier ,Low dose rate ,business ,Dose rate ,Radiation hardening - Abstract
New operational amplifiers have been ELDRS and heavy ions characterized. This paper presents the TID results at high and low dose rate and SEE tests results.
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- 2009
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17. Next-Day Discharge After Transcatheter Aortic Valve Implantation With the ACURATE neo/neo2 Self-Expanding Aortic Bioprosthesis.
- Author
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Ordoñez S, Chu MWA, Diamantouros P, Valdis M, Chaumont G, Vila RCB, Teefy P, and Bagur R
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- Humans, Female, Male, Aged, 80 and over, Prospective Studies, Patient Readmission statistics & numerical data, Prosthesis Design, Aged, Postoperative Complications epidemiology, Time Factors, Aortic Valve surgery, Transcatheter Aortic Valve Replacement methods, Bioprosthesis, Aortic Valve Stenosis surgery, Patient Discharge, Heart Valve Prosthesis
- Abstract
Previous studies have shown the safety of early discharge pathways in selected patients and using selected transcatheter heart valves. Hence, we sought to evaluate the safety of next-day discharge (NDD) in patients who underwent transfemoral transcatheter aortic valve implantation (TF-TAVI) with the ACURATE neo/neo2 (Boston Scientific, Marlborough, Massachusetts) self-expanding aortic bioprosthesis. Patients who underwent TF-TAVI between January 2018 and April 2023 were prospectively included. Patients were stratified into 3 groups according to discharge times within 24 hours (NDD), between 24 and 48 hours, and those discharged >48 hours after TAVI. The primary outcome was the first unplanned readmission at 30 days after TAVI. Log-rank test was used to assess the differences in the outcome of interest between the groups. A total of 368 all-comers were included in this study. According to discharge times, 204 patients followed NDD, 69 patients 24 to 48 hours discharge, and 95 patients >48 hours discharge after TAVI. The mean age was 84 ± 6.3 years and 61% were women, without differences between the groups. The mean Society of Thoracic Surgeons score was lower in those with NDD versus 24 to 48 hours and >48 hours (2.9 ± 1.0, 3.2 ± 1.2, and 3.4 ± 1.4, respectively, p = 0.014). There were no differences between the groups in terms of preprocedural right bundle branch block or pacemaker. The need for new permanent pacemaker implantation was the leading postprocedural complication; it occurred more frequently in the >48 hours group than the 24 to 48 hours, and <24 hours groups (24% vs 8.6% and 2.2%, p <0.001). There were 5 strokes (1.4%) and all of them occurred in the >48 hours group (p = 0.005). At 30 days after discharge, there were no deaths and no differences in all-cause readmissions (9.3% in <24 hours, 8.6% in 24 to 48 hours, and 19% in >48 hours, log-rank p = 0.087). The readmission rates for new permanent pacemaker implantation requirement were 3.3% (n = 6) in NDD, 0% in 24 to 48 hours, and 1.6% (n = 5) in the >48 hours groups (p = 0.27). In conclusion, in unselected patients who underwent TF-TAVI with the ACURATE neo/neo2 self-expanding bioprosthesis, the NDD pathway is feasible and appears to be safe, without an increased risk of death or all-cause rehospitalization through 30 days after hospital discharge., Competing Interests: Declaration of competing interest Dr. Chu has received speaker's honoraria from Medtronic, Edwards Lifesciences, Terumo Aortic, and Artivion Inc. Dr. Diamantouros is a proctor for Boston Scientific. Dr. Bagur is a consultant for Medtronic. The remaining authors have no competing interest to declare., (Copyright © 2024 The Authors. Published by Elsevier Inc. All rights reserved.)
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- 2024
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18. Single Access for Transfemoral Transcatheter Aortic Valve Implantation With the Acurate neo/neo 2 Self-Expanding Valve.
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Bagur R, Chu MWA, Ordoñez S, Valdis M, Gelinas J, Chaumont G, Teefy PJ, and Diamantouros P
- Subjects
- Humans, Aortic Valve diagnostic imaging, Aortic Valve surgery, Prosthesis Design, Treatment Outcome, Transcatheter Aortic Valve Replacement, Aortic Valve Stenosis surgery, Heart Valve Prosthesis
- Published
- 2023
- Full Text
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19. [Working in a specialized halfway house with handicapped persons].
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Chaumont G, Derni C, and Morel P
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- Activities of Daily Living, Communication, Facility Design and Construction, France, Health Promotion, Humans, Disabled Persons rehabilitation, Halfway Houses organization & administration, Nurse's Role
- Published
- 2010
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