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2. How do edge states position themselves in a quantum Hall graphene pn junction?

4. Quantum Hall valley splitters and tunable Mach-Zehnder interferometer in graphene

5. Towards an experimental proof of superhydrophobicity enhanced by quantum fluctuations freezing on a broadband-absorber metamaterial

8. Valley polarization assisted spin polarization in two dimensions

13. Evaluation of light quality, temperature and nutritive deprivation impact onto starch accumulation in Chlorella vulgaris

21. Application of the NBS impact evaluation framework: NBS performance and impact evaluation case studies

22. Indicators of NBS performance and impact

23. CHLORELLA VULGARIS BIOREFINERY: DEVELOPMENT OF A NEW PATHWAY FOR MICROALGAL STARCH-BASED BIOPLASTICS

24. Pushing the limit of lithography for patterning two-dimensional lattices in III-V semiconductor quantum wells

25. BIOREFINERY OF CHLORELLA VULGARIS: NEW PATHWAYS DEVELOPED FOR BIOPLASTICS

29. Pushing the limit of lithography for patterning two-dimensional lattices in III-V semiconductor quantum wells

31. Improving robustness of solutions to arc routing problems

34. Procédé de lithographie par auto-assemblage dirigé

36. Semi-Huber quadratic function and comparative study of some MRFs for Bayesian image restoration

37. MAP entropy estimation: applications in robust image filtering

38. Dry etching challenges for high- block copolymers

39. Block-copolymers performances improvement and design for DSA applications in microelectronic

42. Materials meeting electronic requirements for Sub-10 nm lithography

43. Interface optimization for high-chi block copolymers materials with sub-10 nm resolution

44. Straightforward integration flow of a silicon containing block copolymer for line-space patterning

45. An Akouemma hemisphaeria Organic Macrofossils Colony Hosting Biodiversity Assemblage on the Seafloor of Okondja Basin (Gabon) dated at 2.2 Ga

47. Metaheuristics for the Stochastic Hoist Scheduling Problem (SHSP).

48. Si-containing high- block-copolymers for nanolithography applications

49. Novel Si-containing high-χ block-copolymer for nanolithography application: PS-b-PDMSB

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