Materials meeting electronic requirements for Sub-10 nm lithography

Authors :: Navarro, C.
Nicolet, C.
Chevalier, X.
Xu, K.
Hockey, M. A.
Fleury, G.
Hadziioannou, G.
Legrain, A.
Zelsmann, M.
Pain, L.
Ian Cayrefourcq
Laboratoire des technologies de la microélectronique (LTM )
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
Arkema
Colombes
Clot, Marielle
Source :: Directed Self-Assembly Symposium – DSA 2017, Directed Self-Assembly Symposium – DSA 2017, Oct 2017, Chicago (USA), United States, HAL
Publication Year :: 2017
Publisher :: HAL CCSD, 2017.
Abstract: International audience

Subjects :: [PHYS]Physics [physics]
ComputingMilieux_MISCELLANEOUS
[PHYS] Physics [physics]

Language :: English
Database :: OpenAIRE
Journal :: Directed Self-Assembly Symposium – DSA 2017, Directed Self-Assembly Symposium – DSA 2017, Oct 2017, Chicago (USA), United States, HAL
Accession number :: edsair.dedup.wf.001..69da80b56bd4145b5be3060b48db002b

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