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Microbeam measurements and TCAD simulations are used to examine the effects of ion angle of incidence on the charge collected from events occurring in a Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT). The results identify the geometrically driven charge-collection mechanisms that dominate the low LET broad beam SEU response. The deep trench isolation that surrounds the transistor significantly modulates the charge transport and, therefore, the charge collected by the collector. A new way of estimating critical charge, [Q.sub.crit], for upset in SiGe HBT circuits is proposed based on TCAD simulation results and measured broadbeam data. Index Terms--Deep trench isolation (DTI), HBT, IBICC, silicon germanium (SiGe), single event upset (SEU), TCAD.

We compare, for the first time, the effects of 63 MeV protons on 1st generation and 3rd generation SiGe HBTs irradiated at both liquid nitrogen temperature (77 K) and at room temperature (300 K). The 1st generation SiGe HBTs irradiated at 77 K show less degradation than when irradiated at 300 K. Conversely, the 3rd generation SiGe HBTs exhibits an opposite trend, and the devices irradiated at 77 K show enhanced degradation compared to those irradiated at 300 K. The emitter-base spacer regions for these two SiGe technologies are fundamentally different in construction, and apparently are responsible for the observed differences in temperature-dependent radiation response. At practical circuit biases, both SiGe technology generations show only minimal degradation for both at 77 K and 300 K exposure, to Mrad dose levels, and are thus potentially useful for electronics applications requiring simultaneous cryogenic temperature operation and significant total dose radiation exposure. Index Terms--Interface trapped charge, irradiation, low temperature, proton irradiation, SiGe HBT.

Delayed charge collection from ionizing events outside the deep trench can increase the SEU cross section in deep trench isolation technologies. Microbeam test data and device simulations demonstrate how this adverse effect can be mitigated through substrate engineering techniques. The addition of a heavily doped p-type charge-blocking buried layer in the substrate can reduce the delayed charge collection from events that occur outside the deep trench isolation by almost an order of magnitude, implying an approximately comparable reduction in the SEU cross section. Index Terms--Deep trench isolation, Ion Beam Induced Charge Collection (IBICC), silicon germanium, Single Event Upset (SEU), substrate engineering.

The probability of proton-induced multiple-bit upset (MBU) has increased in highly-scaled technologies because device dimensions are small relative to particle event track size. Both proton-induced single event upset (SEU) and MBU responses have been shown to vary with angle and energy for certain technologies. This work analyzes SEU and MBU in a 130 nm CMOS SRAM in which the single-event response shows a strong dependence on the angle of proton incidence. Current proton testing methods do not account for device orientation relative to the proton beam and, subsequently, error rate prediction assumes no angular dependencies. Proton-induced MBU is expected to increase as integrated circuits continue to scale into the deep sub-micron regime. Consequently, the application of current testing methods will lead to an incorrect prediction of error rates. Index Terms--Energy deposition cross section, multiple-bit upset (MBU), MRED, single event upset (SEU), SRAM, proton effects.

A comprehensive investigation of the effects of proton irradiation on the performance of SiGe BiCMOS precision voltage references intended for extreme environment operational conditions is presented. The voltage reference circuits were designed in two distinct SiGe BiCMOS technology platforms (first generation (50 GHz) and third generation (200 GHz)) in order to investigate the effect of technology scaling. The circuits were irradiated at both room temperature and at 77 K. Measurement results from the experiments indicate that the proton-induced changes in the SiGe bandgap references are minor, even down to cryogenic temperatures, clearly good news for the potential application of SiGe mixed-signal circuits in emerging extreme environments. Index Terms--BiCMOS analog integrated circuits, heterojuction bipolar transistors, proton radiation effects.

The off-state drain current leakage characteristics of 130 nm CMOS technology are investigated using x-ray irradiation and operating temperature as variables. Radiation-induced interface traps in the gate oxide to gate-drain overlap region strongly enhance the off-state leakage as a function of gate bias. Due to the thin gate oxide in these 130 nm devices, we find that drain-edge direct tunneling is more plausible than conventional gate-induced-drain-leakage in explaining the observed increase in drain leakage. Radiation-induced traps in the shallow trench isolation oxide create parasitic channels in the p-well and produce another source of off-state drain leakage with increasing total dose. The drain current increase from both the gate overlap region and the shallow trench edge are enhanced with increasing total dose and suppressed by cooling. Index Terms--CMOS, cryogenic, GIDL, off-state leakage current, shallow trench isolation, STI, total dose radiation effects.

The off-state drain current leakage characteristics of 130 nm CMOS technology are investigated using x-ray irradiation and operating temperature as variables. Radiation-induced interface traps in the gate oxide to gate-drain overlap region strongly enhance the off-state leakage as a function of gate bias. Due to the thin gate oxide in these 130 nm devices, we find that drain-edge direct tunneling is more plausible than conventional gate-induced-drain-leakage in explaining the observed increase in drain leakage. Radiation-induced traps in the shallow trench isolation oxide create parasitic channels in the p-well and produce another source of off-state drain leakage with increasing total dose. The drain current increase from both the gate overlap region and the shallow trench edge are enhanced with increasing total dose and suppressed by cooling. [ABSTRACT FROM AUTHOR]

We compare, for the first time, the effects of 63 MeV protons on 1st generation and 3rd generation SiGe HBTs irradiated at both liquid nitrogen temperature (77 K) and at room temperature (300 K). The 1st generation SiGe HBTs irradiated at 77 K show less degradation than when irradiated at 300 K. Conversely, the 3rd generation SiGe HBTs exhibits an opposite trend, and the devices irradiated at 77 K show enhanced degradation compared to those irradiated at 300 K. The emitter-base spacer regions for these two SiGe technologies are fundamentally different in construction, and apparently are responsible for the observed differences in temperature-dependent radiation response. At practical circuit biases, both SiGe technology generations show only minimal degradation for both at 77 K and 300 K exposure, to Mrad dose levels, and are thus potentially useful for electronics applications requiring simultaneous cryogenic temperature operation and significant total dose radiation exposure. [ABSTRACT FROM AUTHOR]