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Ferroelectric HfO2-based thin films have attracted much interest in the utilization of ferroelectricity at the nanoscale for next-generation electronic devices. However, the structural origin and stabilization mechanism of the ferroelectric phase are not understood because the film is typically nanocrystalline with active yet stochastic ferroelectric domains. Here, electron microscopy is used to map the in-plane domain network structures of epitaxially grown ferroelectric Y:HfO2 films in atomic resolution. The ferroelectricity is confirmed in free-standing Y:HfO2 films, allowing for investigating the structural origin for their ferroelectricity by 4D-STEM, high-resolution STEM, and iDPC-STEM. At the grain boundaries of -oriented Pca21 orthorhombic grains, a high-symmetry mixed-(R3m, Pnm21) phase is induced, exhibiting enhanced polarization due to in-plane compressive strain. Nanoscale Pca21 orthorhombic grains and their grain boundaries with mixed-(R3m, Pnm21) phases of higher symmetry cooperatively determine the ferroelectricity of the Y:HfO2 film. It is also found that such ferroelectric domain networks emerge when the film thickness is beyond a finite value. Furthermore, in-plane mapping of oxygen positions overlaid on ferroelectric domains discloses that polarization is suppressed at vertical domain walls, while it is active when domains are aligned horizontally with subangstrom domain walls. In addition, randomly distributed 180° charged domain walls are confined by spacer layers.

The groundbreaking discovery of unconventional ferroelectricity in HfO2 opens exciting prospects for next‐generation memory devices. However, the practical implementation, particularly its epitaxial stabilization and a clearer understanding of its intrinsic ferroelectricity has been a significant challenge. The study arouses the potential importance of atomic layer deposition (ALD) for mass production in modern industries, demonstrating its proficiency in achieving epitaxial growth of ferroelectric Hf0.5Zr0.5O2 (HZO) thin films on Yttria‐stabilized zirconia (YSZ) substrates. Moreover, with distinct ferroelectric switching currents, the work reveals the ferroelectric characteristics of epitaxial HZO thin films deposited through ALD on YSZ‐buffered Si substrates, which aligns well with CMOS technology. Overall, the results pave the way for a scalable synthesis system for ferroelectric HfO2‐based materials, hinting at a bright future for low‐temperature epitaxial nanoelectronics. [ABSTRACT FROM AUTHOR]

Ferroelectric materials are promising candidates for neuromorphic computing synaptic devices due to the nonvolatile multiplicity of spontaneous polarization. To ensure a sufficient memory window, ferroelectric materials with a large coercivity are urgently required for practical applications in highly scaled multi‐bit memory devices. Herein, a remarkable reliability of intermediate ferroelectric polarization states is demonstrated in a textured Al0.66Sc0.34N thin film with a coercive field of 2.4 MV cm−1. Al0.66Sc0.34N thin films are prepared at 300 °C on Pt (111)/Ti/SiO2/Si substrates using a radio frequency reactive sputtering method. Al0.66Sc0.34N thin films exhibit viable ferroelectricity with a large remanent polarization value of >100 µC cm−2. Through the conventional current–voltage characteristics, polarization switching kinetics, and temperature dependence of coercivity, the reproducibility of multiple polarization states with apparent accuracy is attributed to a small critical volume (3.7 × 10−28 m3) and a large activation energy (3.3 × 1027 eV m−3) for nucleation of the ferroelectric domain. This study demonstrates the potential of ferroelectric Al1‐xScxN for synaptic weight elements in neural network hardware. [ABSTRACT FROM AUTHOR]

This study aimed to estimate impact loads delivered to vibro-ripper housing through link modules, together with loads transmitted in various directions. Housing vibration resulting from impact loads generated during the operating condition and frequency response functions were assessed by vibration and modal experiments, respectively. Vibration data and transfer functions were applied in a transfer path analysis (TPA) model to analyze the quantified impact loads transmitted through the key components of the vibro-ripper to its housing. Impact loads derived by TPA for different housing parts were compared with those in the tooth derived from load-cell measurements, validating the TPA method. As a result of the verification, the impact load calculated by the TPA method was 193.7 kN, whereas that from the striking force measured by the load cell was 220 kN, a difference of 12.3%. The results of this study may be important input values for numerical analysis in equipment design and can be used as key data for structural safety evaluation and optimization. In summary, this paper introduces the vibration-based TPA method and considers its applicability to construction machinery exposed to impact vibration and loads. [ABSTRACT FROM AUTHOR]