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A technique for fabricating micron and submicron-sized polydimethylsiloxane (PDMS) patterns on electronic material substrates is described using decal transfer lithography (DTL) in conjunction with reactive ion-beam etching (RIE). The combined DTL/RIE patterning procedure is compatible with commercially available planarization layers and provides a direct means for preparing high aspect ratio resist features.

A new soft-lithographic method for micropatterning polymeric resists, decal transfer microlithography (DTM), is described. The method is found to be capable of transferring micron to submicron-sized features with high fidelity over large substrate areas and potentially simplifies to a significant degree the requirements for affecting multiple levels of registration.

We describe a technique for fabricating micron and submicron-sized polydimethylsiloxane (PDMS) patterns on electronic material substrates using decal transfer lithography (DTL) in conjunction with reactive ion-beam etching (RIE). We validate the use of this unconventional polymeric system as a suitable resist material for fabricating Si-based microelectronic devices. In this process, an O2/CF4 gas mixture was used to etch a supporting PDMS thin film that resides atop a closed-form decal polymer to reveal conventional resist structures. These structures provide an effective latent image that, in turn, provides for an extension of soft lithography as a form of multilayer lithography—one yielding submicron structures similar to those obtained from the conventional photochemical methods used to prepare such resists. This combined DTL/RIE patterning procedure was found to be compatible with commercially available planarization layers and provides a direct means for preparing high aspect ratio resist features. We illustrate the applicability of soft lithography as a means for fabricating electronic devices by using it to prepare model silicon-based thin-film transistors exploiting silicon-on-insulator wafer technology. [ABSTRACT FROM AUTHOR]

By Mason C. Doan Lanham, Md.: University Press of America, 1996. xvi + 203 pp. Tables, figures, notes, bibliography, statistical appendix, and index. $39.50. ISBN 0-7618-0587-7. Reviewed by William R. [...]

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