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6. An Ecological Study Indicates the Importance of Ultraviolet A Protection in Sunscreens.

Author

MERHI, Samar, SALAMEH, Pascale, KAPLAN, Peter, BANERJEE, Shayak, LAJNEF, Mohamad, DUMONT, Emmanuel L. P., and EZZEDINE, Khaled

Subjects
SUNBURN, SKIN cancer, SUNSCREENS (Cosmetics), GENERALIZED estimating equations, MELANOMA
Abstract

The use of sunscreens is recommended to limit the impact of sun exposure on the skin. The objective of this study was to examine the relationship between sunscreen sales and melanoma in 4 different countries with diverse sunscreen regulations. Data from publicly available databases were examined for Sweden, England, Australia, and the USA from 1999 to 2018. The association between incidence of melanoma and sunscreen sales was estimated using a generalized estimating equation, and modelling was used to predict melanoma cases. Incidence of melanoma was positively associated with sunscreen sales in England, Australia, and the USA, and negatively associated with sunscreen sales in Sweden. Growth rates in melanoma cases of 0.42%, 16.7%, 19.1% and 12.2% were predicted for Sweden, England, Australia, and the USA, respectively. The differences observed between England, Australia, and the USA, on the one hand, and Sweden, on the other hand, are consistent with the adoption of strong regulations requiring the use of ultraviolet A blocking agents in sunscreens. [ABSTRACT FROM AUTHOR]

Published
2021
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28. SMATO.

Author

Banerjee, Shayak, Agarwal, Kanak B., and Orshansky, Michael

Published
2010

34. Enhancing the design-manufacturing interface in nanoscale technologies

Author

Banerjee, Shayak

Subjects
OPC, Optical proximity correction, Retargeting, Target optimization, Electrically-driven OPC
Abstract

Semiconductor scaling has been largely driven by advancements in lithographic technologies. However, the lack of a viable next generation lithography solution since the 180nm node has driven the industry to printing sub-wavelength features. This has led to rising manufacturing costs and diminishing chip yield. In traditional methodologies, manufacturing and design are relatively insulated, with a layout being the only means of communicating design intent to the foundry. In this dissertation, we describe several techniques which utilize electrical information to improve properties of manufactured structures. We aim to show that a bi-directional flow of information between design and manufacturing is key to increasing chip yield. In particular, we target the mask data preparation flow of lithography. We develop an electrically-driven optical proximity correction (ED-OPC) tool that performs electrical matching as opposed to geometric matching in order to achieve lower post-lithography delay error. We then demonstrate how to harness ED-OPC to compensate electrical variability arising from non-lithographic sources as well. We then describe a technique to manufacture circuits with less timing violations across the process window by using design-aware shape tolerances generated from timing information. Finally, we observe that local wiring has low impact on design properties and use this information to modify target wire shapes themselves in order to improve their manufacturability in the presence of process variations.

Published
2010

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