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16 results on '"Angelov, Tihomir"'

3. Pattern-generation and pattern-transfer for single-digit nano devices

Author

Rangelow, Ivo W., Ahmad, Ahmad, Ivanov, Tzvetan, Kaestner, Marcus, Krivoshapkina, Yana, Angelov, Tihomir, Lenk, Steve, Lenk, Claudia, Ishchuk, Valentyn, Hofmann, Martin, Nechepurenko, Diana, Atanasov, Ivaylo, Volland, Burkhard, Guliyev, Elshad, Durrani, Zahid A. K., Jones, Mervyn E., Wang, Chen, Liu, Dixi, Reum, Alexander, Holz, Mathias, Nikolov, Nikolay, Majstrzyk, Wojciech, Gotszalk, Teodor, Staaks, Daniel, Dallorto, Stefano, Olynick, Deirdre L., Rangelow, Ivo W., Ahmad, Ahmad, Ivanov, Tzvetan, Kaestner, Marcus, Krivoshapkina, Yana, Angelov, Tihomir, Lenk, Steve, Lenk, Claudia, Ishchuk, Valentyn, Hofmann, Martin, Nechepurenko, Diana, Atanasov, Ivaylo, Volland, Burkhard, Guliyev, Elshad, Durrani, Zahid A. K., Jones, Mervyn E., Wang, Chen, Liu, Dixi, Reum, Alexander, Holz, Mathias, Nikolov, Nikolay, Majstrzyk, Wojciech, Gotszalk, Teodor, Staaks, Daniel, Dallorto, Stefano, and Olynick, Deirdre L.

Abstract

Single-electron devices operating at room temperature require sub-5 nm quantum dots having tunnel junctions of comparable dimensions. Further development in nanoelectronics depends on the capability to generate mesoscopic structures and interfacing these with complementary metal–oxide–semiconductor devices in a single system. The authors employ a combination of two novel methods of fabricating room temperature silicon single-electron transistors (SETs), Fowler–Nordheim scanning probe lithography (F-N SPL) with active cantilevers and cryogenic reactive ion etching followed by pattern-dependent oxidation. The F-N SPL employs a low energy electron exposure of 5–10 nm thick high-resolution molecular resist (Calixarene) resulting in single nanodigit lithographic performance [Rangelow et al., Proc. SPIE 7637, 76370V (2010)]. The followed step of pattern transfer into silicon becomes very challenging because of the extremely low resist thickness, which limits the etching depth. The authors developed a computer simulation code to simulate the reactive ion etching at cryogenic temperatures (−120 °C). In this article, the authors present the alliance of all these technologies used for the manufacturing of SETs capable to operate at room temperatures.

Published
2016

4. Six-axis AFM in SEM with self-sensing and self-transduced cantilever for high speed analysis and nanolithography

Author

Angelov, Tihomir, primary, Ahmad, Ahmad, additional, Guliyev, Elshad, additional, Reum, Alexander, additional, Atanasov, Ivaylo, additional, Ivanov, Tzvetan, additional, Ishchuk, Valentyn, additional, Kaestner, Marcus, additional, Krivoshapkina, Yana, additional, Lenk, Steve, additional, Lenk, Claudia, additional, Rangelow, Ivo W., additional, Holz, Mathias, additional, and Nikolov, Nikolay, additional

Published
2016
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5. Large area fast-AFM scanning with active “Quattro” cantilever arrays

Author

Ahmad, Ahmad, primary, Nikolov, Nikolay, additional, Angelov, Tihomir, additional, Ivanov, Tzvetan, additional, Reum, Alexander, additional, Atanasov, Ivaylo, additional, Guliyev, Elshad, additional, Ishchuk, Valentyn, additional, Kaestner, Marcus, additional, Krivoshapkina, Yana, additional, Lenk, Steve, additional, Lenk, Claudia, additional, Rangelow, Ivo W., additional, and Holz, Mathias, additional

Published
2016
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6. Pattern-generation and pattern-transfer for single-digit nano devices

Author

Rangelow, Ivo W., primary, Ahmad, Ahmad, additional, Ivanov, Tzvetan, additional, Kaestner, Marcus, additional, Krivoshapkina, Yana, additional, Angelov, Tihomir, additional, Lenk, Steve, additional, Lenk, Claudia, additional, Ishchuk, Valentyn, additional, Hofmann, Martin, additional, Nechepurenko, Diana, additional, Atanasov, Ivaylo, additional, Volland, Burkhard, additional, Guliyev, Elshad, additional, Durrani, Zahid, additional, Jones, Mervyn, additional, Wang, Chen, additional, Liu, Dixi, additional, Reum, Alexander, additional, Holz, Mathias, additional, Nikolov, Nikolay, additional, Majstrzyk, Wojciech, additional, Gotszalk, Teodor, additional, Staaks, Daniel, additional, Dallorto, Stefano, additional, and Olynick, Deirdre L., additional

Published
2016
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8. Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Author

Kaestner, Marcus, primary, Aydogan, Cemal, additional, Ivanov, Tzvetan, additional, Ahmad, Ahmad, additional, Angelov, Tihomir, additional, Reum, Alexander, additional, Ishchuk, Valentyn, additional, Krivoshapkina, Yana, additional, Hofer, Manuel, additional, Lenk, Steve, additional, Atanasov, Ivaylo, additional, Holz, Mathias, additional, and Rangelow, Ivo W., additional

Published
2015
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9. Self-actuated, self-sensing cantilever for fast CD measurement

Author

Ahmad, Ahmad, additional, Ivanov, Tzvetan, additional, Reum, Alexander, additional, Guliyev, Elshad, additional, Angelov, Tihomir, additional, Schuh, Andreas, additional, Kaestner, Marcus, additional, Atanasov, Ivaylo, additional, Hofer, Manuel, additional, Holz, Mathias, additional, and Rangelow, Ivo W., additional

Published
2015
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10. Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Author

Kaestner, Marcus, additional, Aydogan, Cemal, additional, Lipowicz, Hubert-Seweryn, additional, Ivanov, Tzvetan, additional, Lenk, Steve, additional, Ahmad, Ahmad, additional, Angelov, Tihomir, additional, Reum, Alexander, additional, Ishchuk, Valentyn, additional, Atanasov, Ivaylo, additional, Krivoshapkina, Yana, additional, Hofer, Manuel, additional, Holz, Mathias, additional, and Rangelow, Ivo W., additional

Published
2015
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11. Scanning probes in nanostructure fabrication

Author

Kaestner, Marcus, primary, Ivanov, Tzvetan, additional, Schuh, Andreas, additional, Ahmad, Ahmad, additional, Angelov, Tihomir, additional, Krivoshapkina, Yana, additional, Budden, Matthias, additional, Hofer, Manuel, additional, Lenk, Steve, additional, Zoellner, Jens-Peter, additional, Rangelow, Ivo W., additional, Reum, Alexander, additional, Guliyev, Elshad, additional, Holz, Mathias, additional, and Nikolov, Nikolay, additional

Published
2014
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12. Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Author

Kaestner, Marcus, additional, Nieradka, Konrad, additional, Ivanov, Tzvetan, additional, Lenk, Steve, additional, Krivoshapkina, Yana, additional, Ahmad, Ahmad, additional, Angelov, Tihomir, additional, Guliyev, Elshad, additional, Reum, Alexander, additional, Budden, Matthias, additional, Hrasok, Tomas, additional, Hofer, Manuel, additional, Neuber, Christian, additional, and Rangelow, Ivo W., additional

Published
2014
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16. Sensitivity Improvement to Active Piezoresistive AFM Probes Using Focused Ion Beam Processing.

Author

Kunicki, Piotr, Angelov, Tihomir, Ivanov, Tzvetan, Gotszalk, Teodor, and Rangelow, Ivo

Subjects
*FOCUSED ion beams, *ATOMIC force microscopy, *CANTILEVERS
Abstract

This paper presents a comprehensive modeling and experimental verification of active piezoresistive atomic force microscopy (AFM) cantilevers, which are the technology enabling high-resolution and high-speed surface measurements. The mechanical structure of the cantilevers integrating Wheatstone piezoresistive was modified with the use of focused ion beam (FIB) technology in order to increase the deflection sensitivity with minimal influence on structure stiffness and its resonance frequency. The FIB procedure was conducted based on the finite element modeling (FEM) methods. In order to monitor the increase in deflection sensitivity, the active piezoresistive cantilever was deflected using an actuator integrated within, which ensures reliable and precise assessment of the sensor properties. The proposed procedure led to a 2.5 increase in the deflection sensitivity, which was compared with the results of the calibration routine and analytical calculations. [ABSTRACT FROM AUTHOR]

Published
2019
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