173 results on '"Verheijen, M.A."'
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152. Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry
153. A manufacturable 25 nm planar MOSFET technology
154. Metal emitter SiGe:C HBTs
155. Low-energy implantations of decaborane (B/sub 10/H/sub 14/) ion clusters in silicon wafers
156. Periodic nanowire structures.
157. Towards vertical III-V nanowire devices on silicon.
158. A manufacturable 25 nm planar MOSFET technology.
159. Towards vertical III-V nanowire devices.
160. Low-energy implantations of decaborane (B/sub 10/H/sub 14/) ion clusters in silicon wafers.
161. Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry.
162. Structures and phase transitions in C 60 and C 70 fullerites
163. The temperature and chemical composition dependence of the modulation wave vector in ((CH 3) 4N) 2ZnCl 4-xBr x compounds determined from the morphology
164. On the morphology of β-K 2SO 4 type structures; theory and observation
165. Comprehensive computerized survey of the slice configurations of NH 4H 2PO 4 (ADP) type structures
166. Effects of crystalline regrowth on dopant profiles in preamorphized silicon
167. Overpotential analysis of alkaline and acidic alcohol electrolysers and optimized membrane-electrode assemblies.
168. Atomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis.
169. Gas phase grown silicon germanium nanocrystals.
170. Encapsulation method for atom probe tomography analysis of nanoparticles.
171. ScAlN nanowires: A cathodoluminescence study
172. Electrical and structural characterization of PLD grown CeO2–HfO2 laminated high-k gate dielectrics
173. Twinning and morphology of III-V nanowires
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